Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11186748 | Aqueous anionic functional silica slurry and amine carboxylic acid compositions for selective nitride removal in polishing and methods of using them | — | 2021-11-30 |
| 10954411 | Chemical mechanical polishing composition and method of polishing silicon nitride over silicon dioxide and simultaneously inhibiting damage to silicon dioxide | Kwadwo E. Tettey, Matthew Van Hanehem | 2021-03-23 |
| 10822524 | Aqueous compositions of low dishing silica particles for polysilicon polishing | Matthew Van Hanehem, Kwadwo E. Tettey, Koichi Yoshida, Kyohei Yoshida | 2020-11-03 |
| 10787592 | Chemical mechanical polishing compositions and methods having enhanced defect inhibition and selectively polishing silicon nitride over silicon dioxide in an acid environment | Kwadwo E. Tettey, Matthew Van Hanehem | 2020-09-29 |
| 10711158 | Aqueous silica slurry and amine carboxylic acid compositions for use in shallow trench isolation and methods of using them | Zifeng LI | 2020-07-14 |
| 10626298 | Chemical mechanical polishing compositions and methods for suppressing the removal rate of amorphous silicon | Kwadwo E. Tettey, Matthew Van Hanehem | 2020-04-21 |
| 10584265 | Aqueous silica slurry and amine carboxylic acid compositions selective for nitride removal in polishing and methods of using them | Yi Guo, David Mosley, Matthew Van Hanehem, Kwadwo E. Tettey | 2020-03-10 |
| 10508221 | Aqueous low abrasive silica slurry and amine carboxylic acid compositions for use in shallow trench isolation and methods of making and using them | Yi Guo, David Mosley | 2019-12-17 |
| 10316218 | Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them | Julia Kozhukh, David Mosley, Kancharla-Arun Kumar Reddy, Matthew Van Hanehem | 2019-06-11 |
| 10221336 | Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them | Julia Kozhukh, David Mosley, Matthew Van Hanehem, Kancharla-Arun Kumar Reddy | 2019-03-05 |
| 10119048 | Low-abrasive CMP slurry compositions with tunable selectivity | Yi Guo, David Mosley | 2018-11-06 |
| 9150759 | Chemical mechanical polishing composition for polishing silicon wafers and related methods | Yasuyuki Itai, Naoko Kawai, Hiroyuki Nakano, Shinichi Haba, Yoshiharu Ota +6 more | 2015-10-06 |
| 8801959 | Stable, concentratable silicon wafer polishing composition and related methods | Lee Melbourne Cook | 2014-08-12 |
| 8795548 | Silicon wafer polishing composition and related methods | Lee Melbourne Cook | 2014-08-05 |
| 8778203 | Tunable polish rates by varying dissolved oxygen content | P. R. Veera Dandu, Babu V. Suryadevara, Uma Rames Krishna Lagudu | 2014-07-15 |