FY

Fengji Yeh

RH Rohm And Haas Electronic Materials Cmp Holdings: 13 patents #17 of 239Top 8%
Dow Global Technologies: 10 patents #417 of 4,534Top 10%
NH Nitta Haas: 1 patents #22 of 56Top 40%
📍 Wilmington, DE: #358 of 3,182 inventorsTop 15%
🗺 Delaware: #680 of 7,163 inventorsTop 10%
Overall (All Time): #378,896 of 4,157,543Top 10%
13
Patents All Time

Issued Patents All Time

Showing 1–13 of 13 patents

Patent #TitleCo-InventorsDate
10875144 Chemical mechanical polishing pad Bainian Qian, Te-Chun Wang, Sheng-Huan Tseng, Kevin Wen-Huan Tung, Marty W. DeGroot 2020-12-29
10144115 Method of making polishing layer for chemical mechanical polishing pad David Michael Veneziale, Bainian Qian, Teresa Brugarolas Brufau, Julia Kozhukh, Yuhua Tong +5 more 2018-12-04
10105825 Method of making polishing layer for chemical mechanical polishing pad David Michael Veneziale, Bainian Qian, Teresa Brugarolas Brufau, Julia Kozhukh, Yuhua Tong +5 more 2018-10-23
9776300 Chemical mechanical polishing pad and method of making same Bainian Qian, Julia Kozhukh, Teresa Brugarolas Brufau, David Michael Veneziale, Yuhua Tong +7 more 2017-10-03
9586305 Chemical mechanical polishing pad and method of making same Bainian Qian, Julia Kozhukh, Teresa Brugarolas Brufau, David Michael Veneziale, Yuhua Tong +7 more 2017-03-07
9259820 Chemical mechanical polishing pad with polishing layer and window Bainian Qian, Marty W. DeGroot, James Murnane, Angus Repper, Michelle Jensen +3 more 2016-02-16
9238295 Soft and conditionable chemical mechanical window polishing pad Bainian Qian, Michelle Jensen, Marty W. DeGroot, Angus Repper, James Murnane +3 more 2016-01-19
9238296 Multilayer chemical mechanical polishing pad stack with soft and conditionable polishing layer James Murnane, Bainian Qian, John G. Nowland, Michelle Jensen, Jeffrey James Hendron +2 more 2016-01-19
9233451 Soft and conditionable chemical mechanical polishing pad stack James Murnane, Bainian Qian, John G. Nowland, Michelle Jensen, Jeffrey James Hendron +2 more 2016-01-12
9144880 Soft and conditionable chemical mechanical polishing pad Bainian Qian, David B. James, James Murnane, Marty W. DeGroot 2015-09-29
9102034 Method of chemical mechanical polishing a substrate Michelle Jensen, Bainian Qian, Marty W. DeGroot, Mohammad T. Islam, Matthew Van Hanehem +4 more 2015-08-11
9064806 Soft and conditionable chemical mechanical polishing pad with window Bainian Qian, Marty W. DeGroot, Michelle Jensen, James Murnane, Jeffrey James Hendron +2 more 2015-06-23
8980749 Method for chemical mechanical polishing silicon wafers Yasuyuki Itai, Bainian Qian, Hiroyuki Nakano, David B. James, Naoko Kawai +5 more 2015-03-17