ST

Sheng-Huan Tseng

RH Rohm And Haas Electronic Materials Cmp Holdings: 1 patents #157 of 239Top 70%
Overall (All Time): #2,834,312 of 4,157,543Top 70%
1
Patents All Time

Issued Patents All Time

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
10875144 Chemical mechanical polishing pad Bainian Qian, Fengji Yeh, Te-Chun Wang, Kevin Wen-Huan Tung, Marty W. DeGroot 2020-12-29