Issued Patents All Time
Showing 1–25 of 39 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12220784 | Chemical mechanical polishing pad and preparation thereof | Robert Blomquist, Lyla M. El-Sayed, Michael E. Mills, Kancharla-Arun Kumar Reddy, Bradley K. Taylor +1 more | 2025-02-11 |
| 11679531 | Chemical mechanical polishing pad and preparation thereof | Robert Blomquist, Lyla M. El-Sayed, Michael E. Mills, Kancharla-Arun Kumar Reddy, Bradley K. Taylor +1 more | 2023-06-20 |
| 11524390 | Methods of making chemical mechanical polishing layers having improved uniformity | George C. Jacob, Andrew Wank, David Shidner, Kancharla-Arun Kumar Reddy, Donna M. Alden +1 more | 2022-12-13 |
| 11396081 | Chemical mechanical polishing pad | Marty W. DeGroot | 2022-07-26 |
| 10875144 | Chemical mechanical polishing pad | Fengji Yeh, Te-Chun Wang, Sheng-Huan Tseng, Kevin Wen-Huan Tung, Marty W. DeGroot | 2020-12-29 |
| 10722999 | High removal rate chemical mechanical polishing pads and methods of making | Thomas P. Willumstad, Rui Xie, Kenjiro Ogata, George C. Jacob, Marty W. DeGroot | 2020-07-28 |
| 10625393 | Chemical mechanical polishing pads having offset circumferential grooves for improved removal rate and polishing uniformity | Teresa Brugarolas Brufau, Julia Kozhukh | 2020-04-21 |
| 10464187 | High removal rate chemical mechanical polishing pads from amine initiated polyol containing curatives | Kancharla-Arun Kumar Reddy, George C. Jacob, Marty W. DeGroot | 2019-11-05 |
| 10391606 | Chemical mechanical polishing pads for improved removal rate and planarization | Jonathan G. Weis, Nan-Rong Chiou, George C. Jacob | 2019-08-27 |
| 10144115 | Method of making polishing layer for chemical mechanical polishing pad | David Michael Veneziale, Teresa Brugarolas Brufau, Julia Kozhukh, Yuhua Tong, Jeffrey B. Miller +5 more | 2018-12-04 |
| 10105825 | Method of making polishing layer for chemical mechanical polishing pad | David Michael Veneziale, Teresa Brugarolas Brufau, Julia Kozhukh, Yuhua Tong, Jeffrey B. Miller +5 more | 2018-10-23 |
| 10092998 | Method of making composite polishing layer for chemical mechanical polishing pad | Teresa Brugarolas Brufau, Julia Kozhukh, David Michael Veneziale, Yuhua Tong, Diego Lugo +6 more | 2018-10-09 |
| 10011002 | Method of making composite polishing layer for chemical mechanical polishing pad | Teresa Brugarolas Brufau, Julia Kozhukh, David Michael Veneziale, Yuhua Tong, Diego Lugo +6 more | 2018-07-03 |
| 9776300 | Chemical mechanical polishing pad and method of making same | Julia Kozhukh, Teresa Brugarolas Brufau, David Michael Veneziale, Yuhua Tong, Diego Lugo +7 more | 2017-10-03 |
| 9731398 | Polyurethane polishing pad | Raymond Lavoie, Marty W. DeGroot, Benson Lee | 2017-08-15 |
| 9630293 | Chemical mechanical polishing pad composite polishing layer formulation | Julia Kozhukh, Teresa Brugarolas Brufau, Diego Lugo, George C. Jacob, Jeffrey B. Miller +3 more | 2017-04-25 |
| 9586305 | Chemical mechanical polishing pad and method of making same | Julia Kozhukh, Teresa Brugarolas Brufau, David Michael Veneziale, Yuhua Tong, Diego Lugo +7 more | 2017-03-07 |
| 9586304 | Controlled-expansion CMP PAD casting method | Andrew Wank, George C. Jacob | 2017-03-07 |
| 9539694 | Composite polishing layer chemical mechanical polishing pad | Julia Kozhukh, Teresa Brugarolas Brufau | 2017-01-10 |
| 9484212 | Chemical mechanical polishing method | Yi Guo, Marty W. DeGroot, George C. Jacob | 2016-11-01 |
| 9481070 | High-stability polyurethane polishing pad | George C. Jacob, Kun-Ming Tsai | 2016-11-01 |
| 9475168 | Polishing pad window | Ethan S. Simon, George C. Jacob | 2016-10-25 |
| 9457449 | Chemical mechanical polishing pad with composite polishing layer | Teresa Brugarolas Brufau, Julia Kozhukh | 2016-10-04 |
| 9452507 | Controlled-viscosity CMP casting method | George C. Jacob | 2016-09-27 |
| 9446498 | Chemical mechanical polishing pad with window | Joseph So, Janet Tesfai | 2016-09-20 |