Issued Patents All Time
Showing 1–25 of 33 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11638978 | Low-debris fluopolymer composite CMP polishing pad | Nan-Rong Chiou, Joseph So, Mohammad T. Islam, Matthew R. Gadinski, Youngrae Park | 2023-05-02 |
| 11524390 | Methods of making chemical mechanical polishing layers having improved uniformity | Bainian Qian, Andrew Wank, David Shidner, Kancharla-Arun Kumar Reddy, Donna M. Alden +1 more | 2022-12-13 |
| 11491605 | Fluopolymer composite CMP polishing method | Matthew R. Gadinski, Mohammad T. Islam, Nan-Rong Chiou, Youngrae Park | 2022-11-08 |
| 11285577 | Thin film fluoropolymer composite CMP polishing method | Mohammad T. Islam, Nan-Rong Chiou, Matthew R. Gadinski, Youngrae Park, Gregory Scott Blackman +1 more | 2022-03-29 |
| 10722999 | High removal rate chemical mechanical polishing pads and methods of making | Thomas P. Willumstad, Bainian Qian, Rui Xie, Kenjiro Ogata, Marty W. DeGroot | 2020-07-28 |
| 10569384 | Chemical mechanical polishing pad and polishing method | Matthew R. Gadinski, Mohammad T. Islam, Yi Guo | 2020-02-25 |
| 10464188 | Chemical mechanical polishing pad and polishing method | Matthew R. Gadinski, Mohammad T. Islam, Yi Guo | 2019-11-05 |
| 10464187 | High removal rate chemical mechanical polishing pads from amine initiated polyol containing curatives | Bainian Qian, Kancharla-Arun Kumar Reddy, Marty W. DeGroot | 2019-11-05 |
| 10391606 | Chemical mechanical polishing pads for improved removal rate and planarization | Jonathan G. Weis, Nan-Rong Chiou, Bainian Qian | 2019-08-27 |
| 10293456 | Aliphatic polyurethane optical endpoint detection windows and CMP polishing pads containing them | Nan-Rong Chiou, Mohammad T. Islam, Teresa Brugarolas Brufau | 2019-05-21 |
| 10259099 | Tapering method for poromeric polishing pad | Koichi Yoshida, Kazutaka Miyamoto, Katsumasa Kawabata, Henry Sanford-Crane, Hui Bin Huang +1 more | 2019-04-16 |
| 10207388 | Aliphatic polyurethane optical endpoint detection windows and CMP polishing pads containing them | Nan-Rong Chiou, Mohammad T. Islam | 2019-02-19 |
| 10144115 | Method of making polishing layer for chemical mechanical polishing pad | David Michael Veneziale, Bainian Qian, Teresa Brugarolas Brufau, Julia Kozhukh, Yuhua Tong +5 more | 2018-12-04 |
| 10106662 | Thermoplastic poromeric polishing pad | Shuiyuan Luo, Henry Sanford-Crane, Koichi Yoshida, Katsumasa Kawabata, Shusuke Kitawaki +2 more | 2018-10-23 |
| 10105825 | Method of making polishing layer for chemical mechanical polishing pad | David Michael Veneziale, Bainian Qian, Teresa Brugarolas Brufau, Julia Kozhukh, Yuhua Tong +5 more | 2018-10-23 |
| 10092998 | Method of making composite polishing layer for chemical mechanical polishing pad | Bainian Qian, Teresa Brugarolas Brufau, Julia Kozhukh, David Michael Veneziale, Yuhua Tong +6 more | 2018-10-09 |
| 10086494 | High planarization efficiency chemical mechanical polishing pads and methods of making | Jonathan G. Weis, Bhawesh Kumar, Sarah E. Mastroianni, Wenjun Xu, Nan-Rong Chiou +1 more | 2018-10-02 |
| 10011002 | Method of making composite polishing layer for chemical mechanical polishing pad | Bainian Qian, Teresa Brugarolas Brufau, Julia Kozhukh, David Michael Veneziale, Yuhua Tong +6 more | 2018-07-03 |
| 10005172 | Controlled-porosity method for forming polishing pad | Yuhua Tong, Andrew Wank, Diego Lugo, Marc R. Stack, David Michael Veneziale +2 more | 2018-06-26 |
| 9925637 | Tapered poromeric polishing pad | Koichi Yoshida, Kazutaka Miyamoto, Katsumasa Kawabata, Henry Sanford-Crane, Hui Bin Huang +1 more | 2018-03-27 |
| 9776300 | Chemical mechanical polishing pad and method of making same | Bainian Qian, Julia Kozhukh, Teresa Brugarolas Brufau, David Michael Veneziale, Yuhua Tong +7 more | 2017-10-03 |
| 9630293 | Chemical mechanical polishing pad composite polishing layer formulation | Bainian Qian, Julia Kozhukh, Teresa Brugarolas Brufau, Diego Lugo, Jeffrey B. Miller +3 more | 2017-04-25 |
| 9586304 | Controlled-expansion CMP PAD casting method | Bainian Qian, Andrew Wank | 2017-03-07 |
| 9586305 | Chemical mechanical polishing pad and method of making same | Bainian Qian, Julia Kozhukh, Teresa Brugarolas Brufau, David Michael Veneziale, Yuhua Tong +7 more | 2017-03-07 |
| 9481070 | High-stability polyurethane polishing pad | Bainian Qian, Kun-Ming Tsai | 2016-11-01 |