Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11897082 | Heterogeneous fluoropolymer mixture polishing pad | Matthew R. Gadinski | 2024-02-13 |
| 11638978 | Low-debris fluopolymer composite CMP polishing pad | Nan-Rong Chiou, Mohammad T. Islam, Matthew R. Gadinski, Youngrae Park, George C. Jacob | 2023-05-02 |
| 11548114 | Compressible non-reticulated polyurea polishing pad | Matthew R. Gadinski | 2023-01-10 |
| 10875146 | Debris-removal groove for CMP polishing pad | Lee Melbourne Cook, Yuhua Tong, Jeffrey James Hendron, Patricia Connell | 2020-12-29 |
| 9446498 | Chemical mechanical polishing pad with window | Bainian Qian, Janet Tesfai | 2016-09-20 |
| 8357446 | Hollow polymeric-silicate composite | Andrew Wank, Donna M. Alden, Mark Gazze, Robert Gargione, David Drop +2 more | 2013-01-22 |
| 8257152 | Silicate composite polishing pad | Andrew Wank, Donna M. Alden, Robert Gargione, Mark Gazze, David Drop +3 more | 2012-09-04 |
| 8202334 | Method of forming silicate polishing pad | Donna M. Alden, Andrew Wank, Robert Gargione, Mark Gazze, David Drop +2 more | 2012-06-19 |
| 7387964 | Copper polishing cleaning solution | Terence M. Thomas | 2008-06-17 |
| 7384871 | Chemical mechanical polishing compositions and methods relating thereto | Francis Kelley, John Francis Quanci, Hongyu Wang | 2008-06-10 |
| 7303993 | Chemical mechanical polishing compositions and methods relating thereto | Francis Kelley, John Francis Quanci, Hongyu Wang | 2007-12-04 |
| 7084059 | CMP system for metal deposition | Terence M. Thomas | 2006-08-01 |
| 6893328 | Conductive polishing pad with anode and cathode | — | 2005-05-17 |
| 6769968 | Interchangeable conditioning disk apparatus | — | 2004-08-03 |
| 6749485 | Hydrolytically stable grooved polishing pads for chemical mechanical planarization | David B. James, Arun Vishwanathan, Lee Melbourne Cook, Peter A. Burke, David Shidner +1 more | 2004-06-15 |
| 6736709 | Grooved polishing pads for chemical mechanical planarization | David B. James, Arun Vishwanathan, Lee Melbourne Cook, Peter A. Burke, David Shidner +1 more | 2004-05-18 |
| 6530824 | Method and composition for polishing by CMP | Terence M. Thomas, Qianqiu Ye, Wendy Goldberg, Wade Godfrey | 2003-03-11 |
| 6475069 | Control of removal rates in CMP | Terence M. Thomas, Qianqiu (Christine) Ye, Peter A. Burke | 2002-11-05 |