Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9633865 | Low-stain polishing composition | Hongyu Wang | 2017-04-25 |
| 8563436 | Chemical mechanical polishing composition and methods relating thereto | Tirthankar Ghosh, Hongyu Wang, Scott A. Ibbitson | 2013-10-22 |
| 8540893 | Chemical mechanical polishing composition and methods relating thereto | Tirthankar Ghosh, Hongyu Wang, Scott A. Ibbitson | 2013-09-24 |
| 7785487 | Polymeric barrier removal polishing slurry | Qianqiu Ye | 2010-08-31 |
| 7387964 | Copper polishing cleaning solution | Joseph So | 2008-06-17 |
| 7270762 | Polishing compositions for noble metals | Hongyu Wang, Qianqiu Ye, Heinz Reinhardt, Vikas Sachan | 2007-09-18 |
| 7253111 | Barrier polishing solution | Zhendong Liu, John Francis Quanci, Robert Schmidt | 2007-08-07 |
| 7132058 | Tungsten polishing solution | Stephan De Nardi, Wade Godfrey | 2006-11-07 |
| 7084059 | CMP system for metal deposition | Joseph So | 2006-08-01 |
| 7070485 | Polishing composition | Craig Lack, Qianqiu Ye | 2006-07-04 |
| 6971945 | Multi-step polishing solution for chemical mechanical planarization | Zhendong Liu, John Francis Quanci, Robert Schmidt | 2005-12-06 |
| 6936541 | Method for planarizing metal interconnects | Jinru Bian, Tirthankar Ghosh | 2005-08-30 |
| 6699299 | Composition and method for polishing in metal CMP | Vikas Sachan, Elizabeth A. (Kegerise) Langlois, Qianqiu (Christine) Ye, Keith G. Pierce, Craig Lack +3 more | 2004-03-02 |
| 6664188 | Semiconductor wafer with a resistant film | — | 2003-12-16 |
| 6641631 | Polishing of semiconductor substrates | Craig Lack, Steven P. Goehringer | 2003-11-04 |
| 6616717 | Composition and method for polishing in metal CMP | Vikas Sachan, Elizabeth A. (Kegerise) Langlois, Qianqiu (Christine) Ye, Keith G. Pierce, Craig Lack +3 more | 2003-09-09 |
| 6607424 | Compositions for insulator and metal CMP and methods relating thereto | Wesley D. Costas, James Shen, Glenn C. Mandigo, Craig Lack, Ross E. Barker, II | 2003-08-19 |
| 6605537 | Polishing of metal substrates | Jinru Bian, Tirthankar Ghosh | 2003-08-12 |
| 6602112 | Dissolution of metal particles produced by polishing | Tony Quan Tran, Vikas Sachan, David Gettman, Craig Lack, Peter A. Burke | 2003-08-05 |
| 6530824 | Method and composition for polishing by CMP | Qianqiu Ye, Joseph So, Wendy Goldberg, Wade Godfrey | 2003-03-11 |
| 6475069 | Control of removal rates in CMP | Qianqiu (Christine) Ye, Joseph So, Peter A. Burke | 2002-11-05 |
| 6447373 | Chemical mechanical polishing slurries for metal | Craig Lack, Qiuliang Luo, Qianqiu (Christine) Ye, Vikas Sachan, Peter A. Burke | 2002-09-10 |
| 6379406 | Polishing compositions for semiconductor substrates | Craig Lack, Steven P. Goehringer | 2002-04-30 |
| 4547432 | Method of bonding silver to glass and mirrors produced according to this method | John Roland Pitts, Alvin W. Czanderna | 1985-10-15 |