TT

Tony Quan Tran

RH Rohm And Haas Electronic Materials Cmp Holdings: 12 patents #20 of 239Top 9%
Dow Global Technologies: 5 patents #957 of 4,534Top 25%
RH Rodel Holdings: 1 patents #54 of 95Top 60%
📍 Bear, DE: #23 of 286 inventorsTop 9%
🗺 Delaware: #680 of 7,163 inventorsTop 10%
Overall (All Time): #371,663 of 4,157,543Top 9%
13
Patents All Time

Issued Patents All Time

Showing 1–13 of 13 patents

Patent #TitleCo-InventorsDate
11591495 Neutral to alkaline chemical mechanical polishing compositions and methods for tungsten Yi Guo 2023-02-28
10995238 Neutral to alkaline chemical mechanical polishing compositions and methods for tungsten Yi Guo 2021-05-04
10861702 Controlled residence CMP polishing method John Nguyen, Jeffrey James Hendron, Jeffrey Robert Stack 2020-12-08
10857647 High-rate CMP polishing method John Nguyen, Jeffrey James Hendron, Jeffrey Robert Stack 2020-12-08
10857648 Trapezoidal CMP groove pattern John Nguyen, Jeffrey James Hendron, Jeffrey Robert Stack 2020-12-08
10777418 Biased pulse CMP groove pattern John Nguyen, Jeffrey James Hendron, Jeffrey Robert Stack 2020-09-15
10586708 Uniform CMP polishing method John Nguyen, Jeffrey James Hendron, Jeffrey Robert Stack 2020-03-10
10092998 Method of making composite polishing layer for chemical mechanical polishing pad Bainian Qian, Teresa Brugarolas Brufau, Julia Kozhukh, David Michael Veneziale, Yuhua Tong +6 more 2018-10-09
10011002 Method of making composite polishing layer for chemical mechanical polishing pad Bainian Qian, Teresa Brugarolas Brufau, Julia Kozhukh, David Michael Veneziale, Yuhua Tong +6 more 2018-07-03
9776300 Chemical mechanical polishing pad and method of making same Bainian Qian, Julia Kozhukh, Teresa Brugarolas Brufau, David Michael Veneziale, Yuhua Tong +7 more 2017-10-03
9630293 Chemical mechanical polishing pad composite polishing layer formulation Bainian Qian, Julia Kozhukh, Teresa Brugarolas Brufau, Diego Lugo, George C. Jacob +3 more 2017-04-25
9586305 Chemical mechanical polishing pad and method of making same Bainian Qian, Julia Kozhukh, Teresa Brugarolas Brufau, David Michael Veneziale, Yuhua Tong +7 more 2017-03-07
6602112 Dissolution of metal particles produced by polishing Vikas Sachan, David Gettman, Terence M. Thomas, Craig Lack, Peter A. Burke 2003-08-05