Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10875146 | Debris-removal groove for CMP polishing pad | Lee Melbourne Cook, Yuhua Tong, Joseph So, Patricia Connell | 2020-12-29 |
| 10857647 | High-rate CMP polishing method | John Nguyen, Tony Quan Tran, Jeffrey Robert Stack | 2020-12-08 |
| 10857648 | Trapezoidal CMP groove pattern | John Nguyen, Tony Quan Tran, Jeffrey Robert Stack | 2020-12-08 |
| 10861702 | Controlled residence CMP polishing method | John Nguyen, Tony Quan Tran, Jeffrey Robert Stack | 2020-12-08 |
| 10777418 | Biased pulse CMP groove pattern | John Nguyen, Tony Quan Tran, Jeffrey Robert Stack | 2020-09-15 |
| 10586708 | Uniform CMP polishing method | John Nguyen, Tony Quan Tran, Jeffrey Robert Stack | 2020-03-10 |
| 10569383 | Flanged optical endpoint detection windows and CMP polishing pads containing them | Stephen G. Pisklak | 2020-02-25 |
| 10092998 | Method of making composite polishing layer for chemical mechanical polishing pad | Bainian Qian, Teresa Brugarolas Brufau, Julia Kozhukh, David Michael Veneziale, Yuhua Tong +6 more | 2018-10-09 |
| 10011002 | Method of making composite polishing layer for chemical mechanical polishing pad | Bainian Qian, Teresa Brugarolas Brufau, Julia Kozhukh, David Michael Veneziale, Yuhua Tong +6 more | 2018-07-03 |
| 9802293 | Method to shape the surface of chemical mechanical polishing pads | Jeffrey Robert Stack | 2017-10-31 |
| 9630293 | Chemical mechanical polishing pad composite polishing layer formulation | Bainian Qian, Julia Kozhukh, Teresa Brugarolas Brufau, Diego Lugo, George C. Jacob +3 more | 2017-04-25 |
| 9259820 | Chemical mechanical polishing pad with polishing layer and window | Bainian Qian, Marty W. DeGroot, James Murnane, Angus Repper, Michelle Jensen +3 more | 2016-02-16 |
| 9238295 | Soft and conditionable chemical mechanical window polishing pad | Bainian Qian, Michelle Jensen, Marty W. DeGroot, Angus Repper, James Murnane +3 more | 2016-01-19 |
| 9238296 | Multilayer chemical mechanical polishing pad stack with soft and conditionable polishing layer | James Murnane, Bainian Qian, John G. Nowland, Michelle Jensen, Marty W. DeGroot +2 more | 2016-01-19 |
| 9233451 | Soft and conditionable chemical mechanical polishing pad stack | James Murnane, Bainian Qian, John G. Nowland, Michelle Jensen, Marty W. DeGroot +2 more | 2016-01-12 |
| 9102034 | Method of chemical mechanical polishing a substrate | Michelle Jensen, Bainian Qian, Fengji Yeh, Marty W. DeGroot, Mohammad T. Islam +4 more | 2015-08-11 |
| 9064806 | Soft and conditionable chemical mechanical polishing pad with window | Bainian Qian, Marty W. DeGroot, Michelle Jensen, James Murnane, John G. Nowland +2 more | 2015-06-23 |
| 9034063 | Method of manufacturing grooved chemical mechanical polishing layers | Kenneth Vavala, Jeffrey B. Miller, Brian T. Cantrell, James Murnane, Kathleen McHugh +4 more | 2015-05-19 |
| 7807252 | Chemical mechanical polishing pad having secondary polishing medium capacity control grooves | Gregory P. Muldowney | 2010-10-05 |
| 7131895 | CMP pad having a radially alternating groove segment configuration | Carolina L. Elmufdi, Gregory P. Muldowney | 2006-11-07 |
| 6843709 | Chemical mechanical polishing method for reducing slurry reflux | T. Todd Crkvenac, Gregory P. Muldowney | 2005-01-18 |
| 6626740 | Self-leveling pads and methods relating thereto | Arthur Richard Baker, III, Russell A. Walls, Jr., Stephen Carter | 2003-09-30 |