TC

T. Todd Crkvenac

RH Rohm And Haas Electronic Materials Cmp Holdings: 4 patents #59 of 239Top 25%
📍 Hockessin, DE: #218 of 555 inventorsTop 40%
🗺 Delaware: #2,150 of 7,163 inventorsTop 35%
Overall (All Time): #1,248,407 of 4,157,543Top 35%
4
Patents All Time

Issued Patents All Time

Showing 1–4 of 4 patents

Patent #TitleCo-InventorsDate
7569268 Chemical mechanical polishing pad Clyde A. Fawcett, Mary Jo Kulp, Andrew Scott Lawing, Kenneth A. Prygon 2009-08-04
7252871 Polishing pad having a pressure relief channel Robert T. Gamble, Jason M. Lawhorn 2007-08-07
6899602 Porous polyurethane polishing pads Clyde A. Fawcett, Kenneth A. Prygon, Bernard Foster 2005-05-31
6843709 Chemical mechanical polishing method for reducing slurry reflux Jeffrey James Hendron, Gregory P. Muldowney 2005-01-18