KP

Kenneth A. Prygon

RH Rohm And Haas Electronic Materials Cmp Holdings: 2 patents #101 of 239Top 45%
📍 Bear, DE: #125 of 286 inventorsTop 45%
🗺 Delaware: #3,234 of 7,163 inventorsTop 50%
Overall (All Time): #2,137,512 of 4,157,543Top 55%
2
Patents All Time

Issued Patents All Time

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
7569268 Chemical mechanical polishing pad T. Todd Crkvenac, Clyde A. Fawcett, Mary Jo Kulp, Andrew Scott Lawing 2009-08-04
6899602 Porous polyurethane polishing pads Clyde A. Fawcett, T. Todd Crkvenac, Bernard Foster 2005-05-31