CF

Clyde A. Fawcett

RH Rohm And Haas Electronic Materials Cmp Holdings: 2 patents #101 of 239Top 45%
📍 Claymont, DE: #36 of 95 inventorsTop 40%
🗺 Delaware: #3,234 of 7,163 inventorsTop 50%
Overall (All Time): #2,137,513 of 4,157,543Top 55%
2
Patents All Time

Issued Patents All Time

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
7569268 Chemical mechanical polishing pad T. Todd Crkvenac, Mary Jo Kulp, Andrew Scott Lawing, Kenneth A. Prygon 2009-08-04
6899602 Porous polyurethane polishing pads T. Todd Crkvenac, Kenneth A. Prygon, Bernard Foster 2005-05-31