YT

Yuhua Tong

RH Rohm And Haas Electronic Materials Cmp Holdings: 8 patents #36 of 239Top 20%
Dow Global Technologies: 7 patents #666 of 4,534Top 15%
📍 Hockessin, DE: #135 of 555 inventorsTop 25%
🗺 Delaware: #1,197 of 7,163 inventorsTop 20%
Overall (All Time): #635,947 of 4,157,543Top 20%
8
Patents All Time

Issued Patents All Time

Showing 1–8 of 8 patents

Patent #TitleCo-InventorsDate
10875146 Debris-removal groove for CMP polishing pad Lee Melbourne Cook, Joseph So, Jeffrey James Hendron, Patricia Connell 2020-12-29
10144115 Method of making polishing layer for chemical mechanical polishing pad David Michael Veneziale, Bainian Qian, Teresa Brugarolas Brufau, Julia Kozhukh, Jeffrey B. Miller +5 more 2018-12-04
10105825 Method of making polishing layer for chemical mechanical polishing pad David Michael Veneziale, Bainian Qian, Teresa Brugarolas Brufau, Julia Kozhukh, Jeffrey B. Miller +5 more 2018-10-23
10092998 Method of making composite polishing layer for chemical mechanical polishing pad Bainian Qian, Teresa Brugarolas Brufau, Julia Kozhukh, David Michael Veneziale, Diego Lugo +6 more 2018-10-09
10011002 Method of making composite polishing layer for chemical mechanical polishing pad Bainian Qian, Teresa Brugarolas Brufau, Julia Kozhukh, David Michael Veneziale, Diego Lugo +6 more 2018-07-03
10005172 Controlled-porosity method for forming polishing pad Andrew Wank, Diego Lugo, Marc R. Stack, David Michael Veneziale, Marty W. DeGroot +2 more 2018-06-26
9776300 Chemical mechanical polishing pad and method of making same Bainian Qian, Julia Kozhukh, Teresa Brugarolas Brufau, David Michael Veneziale, Diego Lugo +7 more 2017-10-03
9586305 Chemical mechanical polishing pad and method of making same Bainian Qian, Julia Kozhukh, Teresa Brugarolas Brufau, David Michael Veneziale, Diego Lugo +7 more 2017-03-07