Issued Patents All Time
Showing 1–25 of 70 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9446497 | Broad spectrum, endpoint detection monophase olefin copolymer window with specific composition in multilayer chemical mechanical polishing pad | Angus Repper, Mary Anne Leugers, Marty W. DeGroot | 2016-09-20 |
| 9259820 | Chemical mechanical polishing pad with polishing layer and window | Bainian Qian, Marty W. DeGroot, James Murnane, Angus Repper, Michelle Jensen +3 more | 2016-02-16 |
| 9238296 | Multilayer chemical mechanical polishing pad stack with soft and conditionable polishing layer | James Murnane, Bainian Qian, John G. Nowland, Michelle Jensen, Jeffrey James Hendron +2 more | 2016-01-19 |
| 9238295 | Soft and conditionable chemical mechanical window polishing pad | Bainian Qian, Michelle Jensen, Marty W. DeGroot, Angus Repper, James Murnane +3 more | 2016-01-19 |
| 9233451 | Soft and conditionable chemical mechanical polishing pad stack | James Murnane, Bainian Qian, John G. Nowland, Michelle Jensen, Jeffrey James Hendron +2 more | 2016-01-12 |
| 9186772 | Chemical mechanical polishing pad with broad spectrum, endpoint detection window and method of polishing therewith | Angus Repper, Mary Anne Leugers | 2015-11-17 |
| 9144880 | Soft and conditionable chemical mechanical polishing pad | Bainian Qian, James Murnane, Fengji Yeh, Marty W. DeGroot | 2015-09-29 |
| 9073172 | Alkaline-earth metal oxide-polymeric polishing pad | Donna M. Alden, Andrew Wank | 2015-07-07 |
| 9064806 | Soft and conditionable chemical mechanical polishing pad with window | Bainian Qian, Marty W. DeGroot, Michelle Jensen, James Murnane, Jeffrey James Hendron +2 more | 2015-06-23 |
| 8980749 | Method for chemical mechanical polishing silicon wafers | Yasuyuki Itai, Bainian Qian, Hiroyuki Nakano, Naoko Kawai, Katsumasa Kawabata +5 more | 2015-03-17 |
| 8894732 | Hollow polymeric-alkaline earth metal oxide composite | Andrew Wank, Donna M. Alden | 2014-11-25 |
| 8888877 | Forming alkaline-earth metal oxide polishing pad | Donna M. Alden, Andrew Wank, James Murnane | 2014-11-18 |
| 8512427 | Acrylate polyurethane chemical mechanical polishing layer | Jia Xie, Chau Duong | 2013-08-20 |
| 8408977 | Dual-pore structure polishing pad | Henry Sanford-Crane | 2013-04-02 |
| 8162728 | Dual-pore structure polishing pad | Henry Sanford-Crane | 2012-04-24 |
| 7807038 | Method for electrochemical mechanical polishing | Joseph G. Ameen | 2010-10-05 |
| 7618529 | Polishing pad for electrochemical mechanical polishing | Joseph G. Ameen | 2009-11-17 |
| 7537446 | Apparatus for forming a porous reaction injection molded chemical mechanical polishing pad | John V. H. Roberts | 2009-05-26 |
| 7438636 | Chemical mechanical polishing pad | Mary Jo Kulp, Robert F. Antrim | 2008-10-21 |
| 7435364 | Method for forming a porous polishing pad | Mary Jo Kulp, John V. H. Roberts | 2008-10-14 |
| 7399437 | Method for forming a porous reaction injection molded chemical mechanical polishing pad | John V. H. Roberts | 2008-07-15 |
| 7371160 | Elastomer-modified chemical mechanical polishing pad | Carlos A. Cruz, Mary Jo Kulp | 2008-05-13 |
| 7074115 | Polishing pad | Mary Jo Kulp | 2006-07-11 |
| 6869350 | Polishing pads and methods relating thereto | John Roberts, Lee Melbourne Cook | 2005-03-22 |
| 6860802 | Polishing pads for chemical mechanical planarization | Arun Vishwanathan, Lee Melbourne Cook, Peter A. Burke, David Shidner | 2005-03-01 |