DS

David Shidner

RH Rodel Holdings: 5 patents #19 of 95Top 20%
RH Rohm And Haas Electronic Materials Cmp Holdings: 2 patents #101 of 239Top 45%
📍 Newark, DE: #255 of 1,550 inventorsTop 20%
🗺 Delaware: #1,358 of 7,163 inventorsTop 20%
Overall (All Time): #713,153 of 4,157,543Top 20%
7
Patents All Time

Issued Patents All Time

Showing 1–7 of 7 patents

Patent #TitleCo-InventorsDate
11524390 Methods of making chemical mechanical polishing layers having improved uniformity Bainian Qian, George C. Jacob, Andrew Wank, Kancharla-Arun Kumar Reddy, Donna M. Alden +1 more 2022-12-13
6860802 Polishing pads for chemical mechanical planarization Arun Vishwanathan, David B. James, Lee Melbourne Cook, Peter A. Burke 2005-03-01
6749485 Hydrolytically stable grooved polishing pads for chemical mechanical planarization David B. James, Arun Vishwanathan, Lee Melbourne Cook, Peter A. Burke, Joseph So +1 more 2004-06-15
6736709 Grooved polishing pads for chemical mechanical planarization David B. James, Arun Vishwanathan, Lee Melbourne Cook, Peter A. Burke, Joseph So +1 more 2004-05-18
6582283 Polishing pads for chemical mechanical planarization David B. James, Arun Vishwanathan, Lee Melbourne Cook, Peter A. Burke 2003-06-24
6454634 Polishing pads for chemical mechanical planarization David B. James, Arun Vishwanathan, Lee Melbourne Cook, Peter A. Burke 2002-09-24
6361409 Polymeric polishing pad having improved surface layer and method of making same Arun Vishwanathan 2002-03-26