RL

Raymond Lavoie

RH Rohm And Haas Electronic Materials Cmp Holdings: 3 patents #73 of 239Top 35%
Dow Global Technologies: 1 patents #2,632 of 4,534Top 60%
📍 Hockessin, DE: #260 of 555 inventorsTop 50%
🗺 Delaware: #2,574 of 7,163 inventorsTop 40%
Overall (All Time): #1,496,564 of 4,157,543Top 40%
3
Patents All Time

Issued Patents All Time

Showing 1–3 of 3 patents

Patent #TitleCo-InventorsDate
9731398 Polyurethane polishing pad Bainian Qian, Marty W. DeGroot, Benson Lee 2017-08-15
9275899 Chemical mechanical polishing composition and method for polishing tungsten Yi Guo 2016-03-01
8865013 Method for chemical mechanical polishing tungsten Yi Guo, Jerry Lee, Guangyun Zhang 2014-10-21