Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Sub-resolution assist feature to improve symmetry for contact hole lithography

Sub-resolution assist feature to improve symmetry for contact hole lithography

US Patent 7512928 · Granted Mar 31, 2009

Estimated economic value: $10,408,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Integrated circuits having dielectric layers including an anti-reflective coatin2024
Methods for etching metal interconnect layers2023
IC with matched thin film resistors2022
Integrated circuits having dielectric layers including an anti-reflective coatin2021
SRAM cell with T-shaped contact2020
SRAM cell with T-shaped contact2020
Method of fabricating transistors, including ambient oxidizing after etchings in2020
SRAM cell with T-shaped contact2019
SRAM cell with T-shaped contact2018
Metal on elongated contacts2018
Elongated contacts using litho-freeze-litho-etch process2018
Elongated contacts using litho-freeze-litho-etch process2017