Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date | Approx Value ⓘ |
|---|---|---|---|---|
| 7987436 | Sub-resolution assist feature to improve symmetry for contact hole lithography | Scott Jessen, Mark Terry | 2011-07-26 | $16,775,000 |
| 7512928 | Sub-resolution assist feature to improve symmetry for contact hole lithography | Scott Jessen, Mark Terry | 2009-03-31 | $10,408,000 |
| 7341808 | Method and system for contiguous proximity correction for semiconductor masks | Theodore W. Houston, Guohong Zhang, Kayvan Sadra | 2008-03-11 | $13,214,000 |
| 6807661 | Correcting a mask pattern using a clip mask | — | 2004-10-19 | $15,318,000 |
| 6787469 | Double pattern and etch of poly with hard mask | Theodore W. Houston, Thomas J. Aton | 2004-09-07 | $12,102,000 |
| 6785878 | Correcting a mask pattern using multiple correction grids | Carl A. Vickery | 2004-08-31 | $10,407,000 |
| 6764795 | Method and system for mask pattern correction | Thomas J. Aton | 2004-07-20 | $14,138,000 |