Issued Patents All Time
Showing 101–125 of 150 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9190496 | Method of making a FinFET device | Chia Tai Lin, Yih-Ann Lin, An-Shen Chang, Chao-Cheng Chen | 2015-11-17 |
| 9159832 | Semiconductor fin structures and methods for forming the same | Chia-Wei Chang, Srisuda Thitinun | 2015-10-13 |
| 9153440 | Method of forming a semiconductor device | Chih-Han Lin, Ming-Ching Chang, Yih-Ann Lin, Jr-Jung Lin | 2015-10-06 |
| 9048186 | Methods for forming integrated circuits | Kuo-Bin Huang, Hsin-Chien LU, Chi-Ming Yang, Chyi Shyuan Chern, Chin-Hsiang Lin | 2015-06-02 |
| 9034706 | FinFETs with regrown source/drain and methods for forming the same | Eric Chih-Fang Liu, Tzu-Wei Kao, Chao-Cheng Chen | 2015-05-19 |
| 8993452 | Method of patterning a metal gate of semiconductor device | Matt Yeh, Shun Wu Lin, Chi-Chun Chen, Yi-Hsing Chen, Chien-Hao Chen +2 more | 2015-03-31 |
| 8946014 | FinFET device structure and methods of making same | Yu-Chao Lin, Yih-Ann Lin, Chao-Cheng Chen | 2015-02-03 |
| 8932936 | Method of forming a FinFET device | Chia-Chu Liu, Kuei-Shun Chen, Chih-Hsiung Peng, Chi-Kang Chang, Chiang Mu-Chi +3 more | 2015-01-13 |
| 8927358 | Metal oxide semiconductor device having a predetermined threshold voltage and a method of making | Po-Chi Wu | 2015-01-06 |
| 8911559 | Method to pre-heat and stabilize etching chamber condition and improve mean time between cleaning | Yu-Chao Lin, Yih-Ann Lin, Jr-Jung Lin | 2014-12-16 |
| 8900937 | FinFET device structure and methods of making same | Yu-Chao Lin, Cheng-Han Wu, Eric Chih-Fang Liu, Chao-Cheng Chen | 2014-12-02 |
| 8871625 | Spacer structure of a field effect transistor with an oxygen-containing layer between two oxygen-sealing layers | Jin-Aun Ng, Bao-Ru Young, Harry-Hak-Lay Chuang | 2014-10-28 |
| 8841731 | Integrated high-k/metal gate in CMOS process flow | Yih-Ann Lin, Jr-Jung Lin, Yi-Shien Mor, Chien-Hao Chen, Kuo-Tai Huang +1 more | 2014-09-23 |
| 8802510 | Methods for controlling line dimensions in spacer alignment double patterning semiconductor processing | Chia-Wei Chang | 2014-08-12 |
| 8791001 | N2 based plasma treatment and ash for HK metal gate protection | Yu-Chao Lin, Yih-Ann Lin, Jr-Jung Lin | 2014-07-29 |
| 8748989 | Fin field effect transistors | Yu-Chao Lin, Chih-Tang Peng, Shun-Hui Yang, Chao-Cheng Chen | 2014-06-10 |
| 8658539 | Fin profile structure and method of making same | Chia-Wei Chang, Chih-Fang Liu, Chih-Tang Peng, Tai-Chun Huang | 2014-02-25 |
| 8574989 | Semiconductor structure having a polysilicon structure and method of forming same | Che-Cheng Chang, Po-Chi Wu, Buh-Kuan Fang, Jr-Jung Lin | 2013-11-05 |
| 8551837 | Methods of fabricating high-K metal gate devices | Yih-Ann Lin, Chien-Hao Chen, Kuo-Tai Huang, Yi-Hsing Chen, Jr-Jung Lin +1 more | 2013-10-08 |
| 8546891 | Fin profile structure and method of making same | Chia-Wei Chang, Chih-Fang Liu, Chih-Tang Peng, Tai-Chun Huang | 2013-10-01 |
| 8524588 | Method of forming a single metal that performs N work function and P work function in a high-k/metal gate process | Yih-Ann Lin, Donald Y. Chao, Yi-Shien Mor, Kuo-Tai Huang | 2013-09-03 |
| 8450834 | Spacer structure of a field effect transistor with an oxygen-containing layer between two oxygen-sealing layers | Jin-Aun Ng, Bao-Ru Young, Harry-Hak-Lay Chuang | 2013-05-28 |
| 8383502 | Integrated high-K/metal gate in CMOS process flow | Yih-Ann Lin, Jr-Jung Lin, Yi-Shien Mor, Chien-Hao Chen, Kuo-Tai Huang +1 more | 2013-02-26 |
| 8357617 | Method of patterning a metal gate of semiconductor device | Matt Yeh, Shun Wu Lin, Chi-Chun Chen, Yi-Hsing Chen, Chien-Hao Chen +2 more | 2013-01-22 |
| 8349680 | High-k metal gate CMOS patterning method | Kong-Beng Thei, Harry-Hak-Lay Chuang, Su-Chen Lai, Yi-Shien Mor, Yi-Hsing Chen +2 more | 2013-01-08 |