Issued Patents All Time
Showing 126–150 of 150 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8304349 | Method to integrate gate etching as all-in-one process for high K metal gate | Jr-Jung Lin, Yih-Ann Lin | 2012-11-06 |
| 8273632 | Patterning methodology for uniformity control | Yu-Chao Lin, Ming-Ching Chang, Yih-Ann Lin, Chao-Cheng Chen | 2012-09-25 |
| 8258588 | Sealing layer of a field effect transistor | Yu-Chao Lin, Jr-Jung Lin, Yih-Ann Lin, Jih-Jse Lin, Chao-Cheng Chen +1 more | 2012-09-04 |
| 8237231 | Device with aluminum surface protection | Kuo-Bin Huang, Ssu-Yi Li, Chi-Ming Yang, Chyi Shyuan Chern, Chin-Hsiang Lin | 2012-08-07 |
| 8163625 | Method for fabricating an isolation structure | Yih-Ann Lin, Hao-Ming Lien, Jr-Jung Lin, Yu-Chao Lin, Chih-Han Lin | 2012-04-24 |
| 8153523 | Method of etching a layer of a semiconductor device using an etchant layer | Yi-Hsing Chen, Ching-Yu Chang | 2012-04-10 |
| 8148270 | Low K dielectric surface damage control | Hun-Jan Tao, Mong-Song Liang | 2012-04-03 |
| 8148249 | Methods of fabricating high-k metal gate devices | Yih-Ann Lin, Chien-Hao Chen, Kuo-Tai Huang, Yi-Hsing Chen, Jr-Jung Lin +1 more | 2012-04-03 |
| 8119473 | High temperature anneal for aluminum surface protection | Kuo-Bin Huang, Ssu-Yi Li, Chi-Ming Yang, Chyi Shyuan Chern, Chin-Hsiang Lin | 2012-02-21 |
| 8053323 | Patterning methodology for uniformity control | Yu-Chao Lin, Ming-Ching Chang, Yih-Ann Lin, Chao-Cheng Chen | 2011-11-08 |
| 8030214 | Method of fabricating gate structures | Pochi Wu, Ju-Wang Hsu | 2011-10-04 |
| 8003507 | Method of integrating high-K/metal gate in CMOS process flow | Yih-Ann Lin, Jr-Jung Lin, Yi-Shien Mor, Chien-Hao Chen, Kuo-Tai Huang +1 more | 2011-08-23 |
| 7833853 | Method of defining gate structure height for semiconductor devices | Yih-Ann Lin, Joseph Lin, Jr-Jung Lin, Yu-Chao Lin, Chao-Cheng Chen +1 more | 2010-11-16 |
| 7829949 | High-K dielectric metal gate device structure | Joshua Tseng, Kang-Cheng Lin, Ji-Yi Yang, Kuo-Tai Huang | 2010-11-09 |
| 7776755 | Solution for polymer and capping layer removing with wet dipping in HK metal gate etching process | Jr-Jung Lin, Yih-Ann Lin | 2010-08-17 |
| 7759239 | Method of reducing a critical dimension of a semiconductor device | Yu-Chao Lin, De-Fang Chen, Chia-Wei Chang, Yih-Ann Lin, Chao-Cheng Chen +1 more | 2010-07-20 |
| 7709392 | Low K dielectric surface damage control | Hun-Jan Tao, Mong-Song Liang | 2010-05-04 |
| 7632729 | Method for semiconductor device performance enhancement | Harry Chuang, Kong-Beng Thei, Chung Long Cheng, Sheng-Chen Chung, Wen-Huei Guo +2 more | 2009-12-15 |
| 7625791 | High-k dielectric metal gate device structure and method for forming the same | Joshua Tseng, Kang-Cheng Lin, Ji-Yi Yang, Kuo-Tai Huang | 2009-12-01 |
| 7510940 | Method for fabricating dual-gate semiconductor device | Chen-Nan Yeh, Mong-Song Liang, Yuan-Hung Chiu | 2009-03-31 |
| 7249710 | Method of dynamic icons and labels showing status of the memory card in a card reader | Brandon Wang, Tsung-Yi Tseng, Li-Hsin Chuang | 2007-07-31 |
| 7237714 | Method of making computer booting from any one of card of multi-flash card reader | Tsung-Yi Tseng, Brandon Wang | 2007-07-03 |
| 7129989 | Four-field motion adaptive de-interlacing | Liang-Gee Chen, Shyh-Feng Lin, Patrick Chou, Yu-Lin Chang | 2006-10-31 |
| 7109085 | Etching process to avoid polysilicon notching | Shiang-Bau Wang, Li-Te Lin, Ming-Ching Chang, Yuan-Hung Chiu, Hun-Jan Tao | 2006-09-19 |
| 6900104 | Method of forming offset spacer manufacturing for critical dimension precision | Fang Chen, Yuan-Hung Chiu | 2005-05-31 |