Issued Patents All Time
Showing 26–50 of 68 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8987791 | FinFETs and methods for forming the same | Yu-Lien Huang, Chun-Hsiang Fan, Tsu-Hsiu Perng, Chi Kang Liu, Yung-Ta Li +2 more | 2015-03-24 |
| 8946035 | Replacement channels for semiconductor devices and methods for forming the same using dopant concentration boost | Yu-Lien Huang, Clement Hsingjen Wann | 2015-02-03 |
| 8900960 | Integrated circuit device with well controlled surface proximity and method of manufacturing same | Chun-Fai Cheng, Hui Ouyang, Yuan-Hung Chiu, Yen-Ming Chen | 2014-12-02 |
| 8828832 | Strained structure of semiconductor device | Han-Ting Tsai | 2014-09-09 |
| 8809139 | Fin-last FinFET and methods of forming same | Yu-Lien Huang, Clement Hsingjen Wann | 2014-08-19 |
| 8765556 | Method of fabricating strained structure in semiconductor device | Yu-Rung Hsu, Chen-Hua Yu, Chao-Cheng Chen, Hsien-Hsin Lin, Hsueh-Chang Sung | 2014-07-01 |
| 8709897 | High performance strained source-drain structure and method of fabricating the same | Hsueh-Chang Sung, Hsien-Hsin Lin, Chun-Fai Cheng, Wei-Han Fan | 2014-04-29 |
| 8680625 | Facet-free semiconductor device | Wei-Han Fan, Yu-Hsien Lin, Yimin Huang, Hsueh-Chang Sung, Chun-Fai Cheng | 2014-03-25 |
| 8614132 | Integrated circuit device with well controlled surface proximity and method of manufacturing same | Chun-Fai Cheng, Hui Ouyang, Yuan-Hung Chiu, Yen-Ming Chen | 2013-12-24 |
| 8569139 | Method of manufacturing strained source/drain structures | Chun-Feng Nieh, Wei-Han Fan, Yimin Huang, Chun-Fai Cheng, Han-Ting Tsai +1 more | 2013-10-29 |
| 8455859 | Strained structure of semiconductor device | Han-Ting Tsai | 2013-06-04 |
| 8445940 | Source and drain feature profile for improving device performance | Hui Ouyang, Chun-Fai Cheng, Wei-Han Fan | 2013-05-21 |
| 8405160 | Multi-strained source/drain structures | Chun-Fai Cheng, Fung Ka Hing, Chun-Feng Nieh, Yimin Huang, Han-Ting Tsai +1 more | 2013-03-26 |
| 8368147 | Strained semiconductor device with recessed channel | Chun-Fai Cheng, Ka-Hing Fung, Han-Ting Tsai, Wei-Han Fan, Hsueh-Chang Sung +4 more | 2013-02-05 |
| 8236659 | Source and drain feature profile for improving device performance and method of manufacturing same | Chun-Fai Cheng, Hui Ouyang, Yuan-Hung Chiu, Yen-Ming Chen | 2012-08-07 |
| 8216906 | Method of manufacturing integrated circuit device with well controlled surface proximity | Hui Ouyang, Chun-Fai Cheng, Wei-Han Fan | 2012-07-10 |
| 7511349 | Contact or via hole structure with enlarged bottom critical dimension | Fang Chen, Chao-Cheng Chen, Syun-Ming Jang | 2009-03-31 |
| 7265056 | Method for forming novel BARC open for precision critical dimension control | Ru-Chian Chiang, Hun-Jan Tao | 2007-09-04 |
| 7265060 | Bi-level resist structure and fabrication method for contact holes on semiconductor substrates | Hun-Jan Tao, Tsang-Jiuh Wu, Ju-Wang Hsu | 2007-09-04 |
| 7256137 | Method of forming contact plug on silicide structure | Chii-Ming Wu, Chih-Wei Chang, Shau-Lin Shue, Ju-Wang Hsu | 2007-08-14 |
| 7223647 | Method for forming integrated advanced semiconductor device using sacrificial stress layer | Ju-Wang Hsu, Chien-Hao Chen, Yi-Chun Huang | 2007-05-29 |
| 7115526 | Method for wet etching of high k thin film at low temperature | Hsieh Yue Ho, Chih-Cheng Wang, Hsiao Shih-Yi, Kang Tsung-Kuei, Bing-Yue Tsui +4 more | 2006-10-03 |
| 7078351 | Photoresist intensive patterning and processing | Yuan-Hung Chiu, Hun-Jan Tao, Jeng-Horng Chen | 2006-07-18 |
| 7067235 | Bi-layer photoresist dry development and reactive ion etch method | Hun-Jan Tao | 2006-06-27 |
| 6884736 | Method of forming contact plug on silicide structure | Chii-Ming Wu, Mei-Yun Wang, Chih-Wei Chang, Chin-Hwa Hsieh, Shau-Lin Shue +3 more | 2005-04-26 |