MT

Ming-Huan Tsai

TSMC: 62 patents #500 of 12,232Top 5%
MV Mosel Vitelic: 2 patents #107 of 482Top 25%
UM United Microelectronics: 2 patents #1,942 of 4,560Top 45%
📍 Zhubei City, TW: #4 of 1,506 inventorsTop 1%
Overall (All Time): #30,980 of 4,157,543Top 1%
68
Patents All Time

Issued Patents All Time

Showing 51–68 of 68 patents

Patent #TitleCo-InventorsDate
6878639 Borderless interconnection process Ru-Chian Chiang, Hun-Jan Tao 2005-04-12
6867084 Gate structure and method of forming the gate dielectric with mini-spacer Yuan-Hung Chiu, Fang Chen, Hun-Jan Tao 2005-03-15
6838381 Methods for improving sheet resistance of silicide layer after removal of etch stop layer Peng-Fu Hsu, Baw-Ching Perng, Ju-Wang Hsu, Yaun-Hung Chiu 2005-01-04
6828205 Method using wet etching to trim a critical dimension Ming-Jie Huang, Huan-Just Lin, Hun-Jan Tao 2004-12-07
6787455 Bi-layer photoresist method for forming high resolution semiconductor features Hun-Jan Tao, Ju-Wang Hsu, Cheng-Ku Chen 2004-09-07
6780782 Bi-level resist structure and fabrication method for contact holes on semiconductor substrates Hun-Jan Tao, Tsang-Jiuh Wu, Ju-Wang Hsu 2004-08-24
6764911 Multiple etch method for fabricating spacer layers Jw-Wang Hsu, Mei-Ru Kuo, Baw-Ching Peng, Hun-Jan Tao 2004-07-20
6720132 Bi-layer photoresist dry development and reactive ion etch method Hun-Jan Tao 2004-04-13
6706640 Metal silicide etch resistant plasma etch method Ju-Wang Hsu, Peng-Fu Hsu, Hun-Jan Tao 2004-03-16
6630398 Borderless contact with buffer layer Jyh-Huei Chen, Chu-Yun Fu, Hun-Jan Tao 2003-10-07
6444566 Method of making borderless contact having a sion buffer layer Jyh-Huei Chen, Chu-Yun Fu, Hun-Jan Tao 2002-09-03
6436841 Selectivity oxide-to-oxynitride etch process using a fluorine containing gas, an inert gas and a weak oxidant Bao-Ching Pen, Mei-Ru Kuo, Hun-Jan Tao 2002-08-20
6410424 Process flow to optimize profile of ultra small size photo resist free contact Chung-Long Chang, Chii-Ming Wu, Hun-Jan Tao 2002-06-25
6407002 Partial resist free approach in contact etch to improve W-filling Li-Te Lin, Yuan-Hung Chiu, Hun-Jan Tao 2002-06-18
6399437 Enhanced side-wall stacked capacitor Yung-Yi Hsu, Yi Yi, Chia-Shun Hsiao 2002-06-04
6368974 Shrinking equal effect critical dimension of mask by in situ polymer deposition and etching Chan-Lon Yang 2002-04-09
6251791 Eliminating etching microloading effect by in situ deposition and etching Chan-Lon Yang 2001-06-26
5824234 Method for forming low contact resistance bonding pad Chon-Shin Jou, Ting-Sing Wang, Chun-Lin Chen, Ming-Ru Tsai 1998-10-20