Issued Patents All Time
Showing 151–175 of 221 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8237227 | Dummy gate structure for gate last process | Su-Chen Lai, Ming-Yuan Wu, Harry-Hak-Lay Chuang, Chiung-Han Yeh, Hong-Dyi Chang +3 more | 2012-08-07 |
| 8216888 | Eliminating poly uni-direction line-end shortening using second cut | Harry-Hak-Lay Chuang | 2012-07-10 |
| 8202776 | Method for protecting a gate structure during contact formation | Hong-Dyi Chang, Pei-Chao Su, Hun-Jan Tao, Harry-Hak-Lay Chuang | 2012-06-19 |
| 8173491 | Standard cell architecture and methods with variable design rules | Oscar M. K. Law, Manoj Joshi, Harry-Hak-Lay Chuang | 2012-05-08 |
| 8174091 | Fuse structure | Chung Long Cheng, Chung-Shi Liu, Harry Chuang, Shien-Yang Wu, Shi-Bai Chen | 2012-05-08 |
| 8153498 | Downsize polysilicon height for polysilicon resistor integration of replacement gate process | Chen-Pin Hsu, Chung Long Cheng, Harry-Hak-Lay Chuang | 2012-04-10 |
| 8143131 | Method of fabricating spacers in a strained semiconductor device | Chen-Pin Hsu, Harry-Hak-Lay Chuang | 2012-03-27 |
| 8138554 | Semiconductor device with local interconnects | Harry Chuang, Sheng-Chen Chung, Mong-Song Liang | 2012-03-20 |
| 8125051 | Device layout for gate last process | Harry-Hak-Lay Chuang, Chiung-Han Yeh, Mong-Song Liang, Hou-Ju Li, Ming-Yuan Wu +1 more | 2012-02-28 |
| 8120086 | Low leakage capacitors including portions in inter-layer dielectrics | Oscar M. K. Law, Harry-Hak-Lay Chuang | 2012-02-21 |
| 8115271 | Reducing device performance drift caused by large spacings between active regions | Harry Chuang, Mong-Song Liang | 2012-02-14 |
| 8105929 | Gate control and endcap improvement | Harry-Hak-Lay Chuang | 2012-01-31 |
| 8105891 | Method for tuning a work function of high-K metal gate devices | Chiung-Han Yeh, Sheng-Chen Chung, Harry-Hak-Lay Chuang | 2012-01-31 |
| 8093120 | Integrating a first contact structure in a gate last process | Chiung-Han Yeh, Ming-Yuan Wu, Harry-Hak-Lay Chuang, Mong-Song Liang | 2012-01-10 |
| 8093116 | Method for N/P patterning in a gate last process | Sheng-Chen Chung, Harry-Hak-Lay Chuang | 2012-01-10 |
| 8058119 | Device scheme of HKMG gate-last process | Sheng-Chen Chung, Harry-Hak-Lay Chuang | 2011-11-15 |
| 8048752 | Spacer shape engineering for void-free gap-filling process | Ming-Yuan Wu, Yi-Shien Mor, Chih-Tang Peng, Chiung-Han Yeh, Harry-Hak-Lay Chuang +1 more | 2011-11-01 |
| 8039381 | Photoresist etch back method for gate last process | Chiung-Han Yeh, Chen-Pin Hsu, Ming-Yuan Wu, Harry-Hak-Lay Chuang | 2011-10-18 |
| 8035165 | Integrating a first contact structure in a gate last process | Chiung-Han Yeh, Ming-Yuan Wu, Harry-Hak-Lay Chuang, Mong-Song Liang | 2011-10-11 |
| 8017473 | Modifying work function in PMOS devices by counter-doping | Chun-Yi Lee, Harry-Hak-Lay Chuang, Ping-Wei Wang | 2011-09-13 |
| 8008145 | High-K metal gate structure fabrication method including hard mask | Shun-Jang Liao, Sheng-Chen Chung, Harry-Hak-Lay Chuang | 2011-08-30 |
| 7998830 | Semiconductor device with both I/O and core components and method of fabricating same | Chung Long Cheng, Sheng-Chen Chung, Harry-Hak-Lay Chuang, Mong-Song Liang | 2011-08-16 |
| 7985690 | Method for a gate last process | Harry-Hak-Lay Chuang, Su-Chen Lai, Gary Shen | 2011-07-26 |
| 7981801 | Chemical mechanical polishing (CMP) method for gate last process | Harry-Hak-Lay Chuang, Su-Chen Lai, Gary Shen | 2011-07-19 |
| 7977754 | Poly resistor and poly eFuse design for replacement gate technology | Harry-Hak-Lay Chuang | 2011-07-12 |