Issued Patents All Time
Showing 126–150 of 168 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5856069 | Method for forming pattern | Akiko Katsuyama | 1999-01-05 |
| 5846692 | Pattern formation method | Akiko Katsuyama | 1998-12-08 |
| 5795828 | Electroless plating bath used for forming a wiring of a semiconductor device, and method of forming a wiring of a semiconductor device | Akemi Kawaguchi, Mikio Nishio, Shin Hashimoto | 1998-08-18 |
| 5773174 | Method of forming a resist pattern utilizing correlation between latent image height, resist pattern linewidth and surface modification layer width | Taichi Koizumi, Takahiro Matsuo | 1998-06-30 |
| 5756262 | Method for forming pattern | Akiko Katsuyama | 1998-05-26 |
| 5756242 | Method of forming a resist pattern utilizing correlation between latent image height, resist pattern linewidth and exposure parameter | Taichi Koizumi, Takahiro Matsuo | 1998-05-26 |
| 5741628 | Method of forming micropatterns by having a resist film absorb water | Takahiro Matsuo, Kazuhiro Yamashita, Masaru Sasago | 1998-04-21 |
| 5679500 | Method of forming micropatterns utilizing silylation and overall energy beam exposure | Takahiro Matsuo, Kazuhiro Yamashita, Masaru Sasago | 1997-10-21 |
| 5677112 | Process for forming a pattern on a semiconductor substrate using a deep ultraviolet absorbent composition | Fumiyoshi Urano, Keiji Oono, Hiroshi Matsuda, Satoshi Kobayashi | 1997-10-14 |
| 5658711 | Method of forming micropatterns | Takahiro Matsuo, Kazuhiro Yamashita, Masaru Sasago | 1997-08-19 |
| 5645628 | Electroless plating bath used for forming a wiring of a semiconductor device, and method of forming a wiring of a semiconductor device | Akemi Kawaguchi, Mikio Nishio, Shin Hashimoto | 1997-07-08 |
| 5576247 | Thin layer forming method wherein hydrophobic molecular layers preventing a BPSG layer from absorbing moisture | Kousaku Yano, Yuka Terai, Noboru Nomura, Tomoyasu Murakami, Tetsuya Ueda +1 more | 1996-11-19 |
| 5576359 | Deep ultraviolet absorbent composition | Fumiyoshi Urano, Keiji Oono, Hiroshi Matsuda, Satoshi Kobayashi | 1996-11-19 |
| 5569628 | Semiconductor device fabrication method | Kousaku Yano, Tomoyasu Murakami, Noboru Nomura | 1996-10-29 |
| 5558971 | Resist material | Fumiyoshi Urano, Takaai Negishi, Akiko Katsuyama | 1996-09-24 |
| 5558976 | Pattern formation method | Fumiyoshi Urano, Takaaki Negishi, Akiko Katsuyama | 1996-09-24 |
| 5530036 | Epoxy group-containing copolymer and radiation sensitive resin compositions thereof | Kimiyasu Sano, Atsufumi Shimada, Yasuaki Yokoyama, Nobuo Bessho | 1996-06-25 |
| 5525457 | Reflection preventing film and process for forming resist pattern using the same | Hiroaki Nemoto, Yoshiji Yumoto, Takao Miura | 1996-06-11 |
| 5476753 | Fine pattern forming method | Kazuhiko Hashimoto | 1995-12-19 |
| 5472826 | Semiconductor device fabrication method | Teruhito Ohnishi, Noboru Nomura | 1995-12-05 |
| 5432039 | Radiation sensitive quinone diazide and resin composition for microlens | Tsutomu Shimokawa, Atsufumi Shimada, Nobuo Bessho | 1995-07-11 |
| 5401932 | Method of producing a stencil mask | Kazuhiko Hashimoto, Masaru Sasago | 1995-03-28 |
| 5399604 | Epoxy group-containing resin compositions | Kimiyasu Sano, Atsufumi Shimada, Yasuaki Yokoyama, Nobuo Bessho | 1995-03-21 |
| 5389491 | Negative working resist composition | Yoshiyuki Tani, Fumiyoshi Urano, Takanori Yasuda | 1995-02-14 |
| 5364910 | Material for forming coating film | Fumitaka Takinishi, Makiko Togo, Yasuaki Yokoyama | 1994-11-15 |