Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7171640 | System and method for operation verification of semiconductor integrated circuit | Kyoji Yamashita | 2007-01-30 |
| 6372928 | Layer forming material and wiring forming method | Akemi Kawaguchi, Kousaku Yano | 2002-04-16 |
| 5863338 | Apparatus and method for forming thin film | Yuichiro Yamada, Naoki Suzuki, Ryuzo Houchin, Noboru Nomura, Kousaku Yano | 1999-01-26 |
| 5773639 | Layer forming material and wiring forming method | Akemi Kawaguchi, Kousaku Yano | 1998-06-30 |
| 5693557 | Method of fabricating a semiconductor device | Shuji Hirao, Hisashi Ogawa, Mitsuru Sekiguchi, Masanori Fukumoto, Isao Miyanaga | 1997-12-02 |
| 5661068 | Method of fabricating a semiconductor device | Shuji Hirao, Hisashi Ogawa, Mitsuru Sekiguchi, Masanori Fukumoto, Isao Miyanaga | 1997-08-26 |
| 5633211 | Semiconductor device and process | Shinichi Imai, Masanori Fukumoto, Kousaku Yano, Hiroyuki Umimoto, Shinji Odanaka +1 more | 1997-05-27 |
| 5576247 | Thin layer forming method wherein hydrophobic molecular layers preventing a BPSG layer from absorbing moisture | Kousaku Yano, Masayuki Endo, Noboru Nomura, Tomoyasu Murakami, Tetsuya Ueda +1 more | 1996-11-19 |
| 5501739 | Apparatus and method for forming thin film | Yuichiro Yamada, Naoki Suzuki, Ryuzo Houchin, Noboru Nomura, Kousaku Yano | 1996-03-26 |
| 5474949 | Method of fabricating capacitor or contact for semiconductor device by forming uneven oxide film and reacting silicon with metal containing gas | Shuji Hirao, Hisashi Ogawa, Mitsuru Sekiguchi, Masanori Fukumoto, Isao Miyanaga | 1995-12-12 |
| 5314848 | Method for manufacturing a semiconductor device using a heat treatment according to a temperature profile that prevents grain or particle precipitation during reflow | Takatoshi Yasui, Chiaki Kudo, Ichiro Nakao, Toyokazu Fujii, Shinichi Imai +2 more | 1994-05-24 |