ME

Masayuki Endo

Sumitomo Electric Industries: 114 patents #9 of 21,551Top 1%
SC Shin-Etsu Chemical Co.: 32 patents #121 of 2,176Top 6%
PA Panasonic: 27 patents #613 of 21,108Top 3%
CL Central Glass Company, Limited: 26 patents #18 of 968Top 2%
WI Wako Pure Chemical Industries: 9 patents #18 of 377Top 5%
JR Japan Synthetic Rubber: 7 patents #32 of 558Top 6%
JS Jsr: 7 patents #154 of 1,137Top 15%
TK Terumo Kabushiki Kaisha: 3 patents #444 of 1,558Top 30%
Mitsubishi Electric: 2 patents #11,187 of 25,717Top 45%
Sharp Kabushiki Kaisha: 2 patents #5,184 of 10,731Top 50%
Casio Computer Co.: 2 patents #935 of 1,970Top 50%
SO Sony: 1 patents #17,262 of 25,231Top 70%
IR International Center For Materials Research: 1 patents #5 of 14Top 40%
KU Kent State University: 1 patents #128 of 294Top 45%
KS Kobe Steel: 1 patents #937 of 1,773Top 55%
Nichia: 1 patents #1,005 of 1,531Top 70%
TC Tokyo Ohka Kogyo Co.: 1 patents #437 of 684Top 65%
📍 Hamura, JP: #1 of 277 inventorsTop 1%
Overall (All Time): #4,896 of 4,157,543Top 1%
168
Patents All Time

Issued Patents All Time

Showing 151–168 of 168 patents

Patent #TitleCo-InventorsDate
5316891 Fine pattern forming method Kazuhiko Hashimoto 1994-05-31
5312776 Method of preventing the corrosion of metallic wirings Tomoyasu Murakami, Michinari Yamanaka, Kousaku Yano, Noboru Nomura, Staoshi Ueda +3 more 1994-05-17
5272036 Pattern forming contrast enhanced material utilizing water soluble photosensitive diazo compound and pattern forming method Yoshiyuki Tani, Kazufumi Ogawa, Fumiyoshi Urano, Masaaki Nakahata 1993-12-21
5250669 Photosensitive compound Kazufumi Ogawa, Keiji Ohno, Mamoru Nagoya 1993-10-05
5169741 Method for forming high sensitivity positive patterns employing a material containing a photosensitive compound having a diazo group, an alkaline-soluble polymer, a compound capable of adjusting the pH to 4 or less and a solvent Yoshiyuki Tani 1992-12-08
4923948 Curable composition Yasuo Matsuki, Yosinobu Kariya, Hiroharu Ikeda, Yoshihiro Hosaka 1990-05-08
4910123 Pattern forming method Masaru Sasago, Kazufumi Ogawa 1990-03-20
4849323 Pattern forming method using contrast enhanced material Masaru Sasago, Kazufumi Ogawa 1989-07-18
4840872 Pattern forming method by use of X-ray exposure Masaru Sasago, Kazufumi Ogawa 1989-06-20
4841341 Integrator for an exposure apparatus or the like Kazufumi Ogawa, Masaru Sasago, Ken Ishihara 1989-06-20
4812880 Exposure apparatus Kazufumi Ogawa, Masaru Sasago, Takeshi Ishihara 1989-03-14
4805002 Exposure apparatus Masaru Sasago, Kazufumi Ogawa, Takeshi Ishihara 1989-02-14
4805000 Exposure apparatus Kazufumi Ogawa, Masaru Sasago, Takeshi Ishihara 1989-02-14
4782368 Method for correction for chromatic aberration and exposure apparatus using the same Kazufumi Ogawa, Masaru Sasago, Takeshi Ishihara 1988-11-01
4745042 Water-soluble photopolymer and method of forming pattern by use of the same Masaru Sasago, Kenichi Takeyama, Noboru Nomura 1988-05-17
4724466 Exposure apparatus Kazufumi Ogawa, Masaru Sasago, Takeshi Ishihara 1988-02-09
4696800 Ozone generating apparatus Toshihiko Sasaki, Yooji Sunayama, Isao Yoshida 1987-09-29
4182813 Process for the preparation of 1,2-polybutadiene Kenya Makino, Koei Komatsu, Yasumasa Takeuchi 1980-01-08