Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6977133 | Photomask and pattern forming method | Akio Misaka | 2005-12-20 |
| 5773174 | Method of forming a resist pattern utilizing correlation between latent image height, resist pattern linewidth and surface modification layer width | Takahiro Matsuo, Masayuki Endo | 1998-06-30 |
| 5763124 | Method of forming a resist pattern utilizing correlation between latent image height, resist pattern linewidth and thermal annealing parameter | Takahiro Matsuo | 1998-06-09 |
| 5756242 | Method of forming a resist pattern utilizing correlation between latent image height, resist pattern linewidth and exposure parameter | Takahiro Matsuo, Masayuki Endo | 1998-05-26 |
| 5306601 | Fine pattern forming material and pattern forming method | Kazuhiko Hashimoto, Kenji Kawakita, Noboru Nomura | 1994-04-26 |
| 5275921 | Pattern forming process | Yoshiyuki Tani, Masaru Sasago | 1994-01-04 |
| 5169494 | Fine pattern forming method | Kazuhiko Hashimoto, Kenji Kawakita, Noboru Nomura | 1992-12-08 |
| 5057689 | Scanning electron microscope and a method of displaying cross sectional profiles using the same | Noboru Nomura, Hideo Nakagawa, Kenji Harafuji, Mitsuhiro Okuni, Norimichi Anazawa | 1991-10-15 |
| 5030549 | Fine pattern forming method | Kazuhiko Hashimoto, Kenji Kawakita, Noboru Nomura | 1991-07-09 |
| 4976818 | Fine pattern forming method | Kazuhiko Hashimoto, Kenji Kawakita, Noboru Nomura | 1990-12-11 |
| 4936951 | Method of reducing proximity effect in electron beam resists | Kazuhiko Hashimoto, Kenji Kawakita, Noboru Nomura | 1990-06-26 |