Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8686544 | Semiconductor device | Kimihito Kuwabara | 2014-04-01 |
| 7160748 | Method for fabricating nitride semiconductor, method for fabricating nitride semiconductor device, and nitride semiconductor device | Akihiko Ishibashi, Ayumu Tsujimura, Yoshiaki Hasegawa, Nobuyuki Otsuka, Gaku Sugahara +4 more | 2007-01-09 |
| 6921678 | Method for fabricating nitride semiconductor, method for fabricating nitride semiconductor device, and nitride semiconductor device | Akihiko Ishibashi, Ayumu Tsujimura, Yoshiaki Hasegawa, Nobuyuki Otsuka, Gaku Sugahara +4 more | 2005-07-26 |
| 6867112 | Method of fabricating nitride semiconductor device | Akihiko Ishibashi, Isao Kidoguchi, Yuzaburo Ban | 2005-03-15 |
| 6737684 | Bipolar transistor and semiconductor device | Takeshi Takagi | 2004-05-18 |
| 6667185 | Method of fabricating nitride semiconductor device | Akihiko Ishibashi, Isao Kidoguchi, Yuzaburo Ban | 2003-12-23 |
| 6586774 | Method for fabricating nitride semiconductor, method for fabricating nitride semiconductor device, and nitride semiconductor device | Akihiko Ishibashi, Ayumu Tsujimura, Yoshiaki Hasegawa, Nobuyuki Otsuka, Gaku Sugahara +4 more | 2003-07-01 |
| 6544869 | Method and apparatus for depositing semiconductor film and method for fabricating semiconductor device | Akihiko Ishibashi, Yuzaburo Ban, Kiyoshi Ohnaka | 2003-04-08 |
| 6466597 | Semiconductor laser device | Masahiro Kume, Yuzaburo Ban, Isao Kidoguchi, Satoshi Kamiyama, Ayumu Tsujimura +3 more | 2002-10-15 |
| 5928528 | Plasma treatment method and plasma treatment system | Masafumi Kubota, Shigenori Hayashi, Michinari Yamanaka | 1999-07-27 |
| 5869402 | Plasma generating and processing method and apparatus thereof | Masafumi Kubota | 1999-02-09 |
| 5635021 | Dry etching Method | — | 1997-06-03 |
| 5424905 | Plasma generating method and apparatus | Noboru Nomura, Masafumi Kubota, Tokuhiko Tamaki, Mitsuhiro Ohkuni, Ichiro Nakayama | 1995-06-13 |
| 5345145 | Method and apparatus for generating highly dense uniform plasma in a high frequency electric field | Mitsuhiro Ohkuni, Tokuhiko Tamaki, Masafumi Kubota, Noboru Nomura | 1994-09-06 |
| 5332880 | Method and apparatus for generating highly dense uniform plasma by use of a high frequency rotating electric field | Masafumi Kubota, Tokuhiko Tamaki, Mitsuhiro Ohkuni, Noboru Nomura, Ichiro Nakayama | 1994-07-26 |
| 5324388 | Dry etching method and dry etching apparatus | Atsuhiro Yamano, Masafumi Kubota | 1994-06-28 |
| 5259922 | Drying etching method | Atsuhiro Yamano, Tokuhiko Tamaki, Masafumi Kubota, Noboru Nomura | 1993-11-09 |
| 5182718 | Method and apparatus for writing a pattern on a semiconductor sample based on a resist pattern corrected for proximity effects resulting from direct exposure of the sample by a charged-particle beam or light | Akio Misaka, Hiromitsu Hamaguchi, Kenji Kawakita | 1993-01-26 |
| 5057689 | Scanning electron microscope and a method of displaying cross sectional profiles using the same | Noboru Nomura, Hideo Nakagawa, Taichi Koizumi, Mitsuhiro Okuni, Norimichi Anazawa | 1991-10-15 |
| 4998020 | Electron beam exposure evaluation method | Akio Misaka, Kenji Kawakita, Hiromitsu Hamaguchi | 1991-03-05 |