Issued Patents All Time
Showing 25 most recent of 51 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12299368 | Method of manufacturing a semiconductor device | Jongdoo Kim, Noyoung Chung | 2025-05-13 |
| 11698581 | Method and computing device for manufacturing semiconductor device | Changsoo Kim, Noyoung Chung | 2023-07-11 |
| 11092885 | Manufacturing methods of semiconductor devices | Noyoung Chung, Woonhyuk Choi | 2021-08-17 |
| 10962874 | Methods of manufacturing semiconductor devices, method sof performing extreme ultraviolet ray exposure, and methods of performing optical proximity correction | No Young Chung, Ki-Soo Kim | 2021-03-30 |
| 9658524 | Photomask, and method for creating pattern data thereof, and pattern forming method and processing method using photomask | — | 2017-05-23 |
| 9507252 | Photomask and pattern forming method using photomask | — | 2016-11-29 |
| 9291889 | Photo mask and method for forming pattern using the same | Yoshimasa YOSHIOKA, Shigeo Irie, Hiroshi Sakaue, Masaru Sasago | 2016-03-22 |
| 9046783 | Photomask, and pattern formation method and exposure apparatus using the photomask | Masaru Sasago | 2015-06-02 |
| 8869079 | Semiconductor device and layout design method for the same | Yasuko Tabata, Hideyuki Arai, Takayuki Yamada | 2014-10-21 |
| 8392856 | Semiconductor device and layout design method for the same | Yasuko Tabata, Hideyuki Arai, Takayuki Yamada | 2013-03-05 |
| 8330248 | Semiconductor device, mask for fabrication of semiconductor device, and optical proximity correction method | Yasuko Tabata, Takehiro Hirai, Hideyuki Arai, Yuji Nonami | 2012-12-11 |
| 8278014 | Photomask and pattern formation method using the same | Shigeo Irie, Yuji Nonami, Tetsuya Nakamura, Chika Harada | 2012-10-02 |
| 8095894 | Changing a design rule for forming LSI pattern based on evaluating effectiveness of optical proximity corrected patterns | Shinji Odanaka | 2012-01-10 |
| 8007959 | Photomask and pattern formation method using the same | Yuji Nonami, Shigeo Irie | 2011-08-30 |
| 7998641 | Photomask and pattern formation method using the same | Shigeo Irie, Yuji Nonami, Tetsuya Nakamura, Chika Harada | 2011-08-16 |
| 7914953 | Photomask and pattern formation method using the same | Tadami Shimizu, Masaru Sasago | 2011-03-29 |
| 7897298 | Photomask, photomask fabrication method, pattern formation method using the photomask and mask data creation method | — | 2011-03-01 |
| 7842436 | Photomask | — | 2010-11-30 |
| 7790337 | Photomask, pattern formation method using the same and mask data creation method | — | 2010-09-07 |
| 7771902 | Photomask, fabrication method for the same and pattern formation method using the same | — | 2010-08-10 |
| 7625678 | Mask data creation method | — | 2009-12-01 |
| 7618754 | Pattern formation method | — | 2009-11-17 |
| 7569312 | Mask data creation method | — | 2009-08-04 |
| 7524620 | Pattern formation method | — | 2009-04-28 |
| 7504186 | Photomask, method for producing the same, and method for forming pattern using the photomask | — | 2009-03-17 |