AM

Akio Misaka

PA Panasonic: 24 patents #737 of 21,108Top 4%
Sumitomo Electric Industries: 23 patents #806 of 21,551Top 4%
Samsung: 4 patents #25,854 of 75,807Top 35%
Overall (All Time): #51,932 of 4,157,543Top 2%
51
Patents All Time

Issued Patents All Time

Showing 26–50 of 51 patents

Patent #TitleCo-InventorsDate
7501213 Method for forming generating mask data 2009-03-10
7468240 Patterning method using photomask 2008-12-23
7449285 Method for forming pattern 2008-11-11
7404165 Method for planning layout for LSI pattern, method for forming LSI pattern and method for generating mask data for LSI Shinji Odanaka 2008-07-22
7378198 Photomask 2008-05-27
7364822 Photomask, method for forming the same, and method for forming pattern using the photomask 2008-04-29
7361436 Pattern formation method 2008-04-22
7337423 Mask pattern generating method and mask pattern generating apparatus Minoru Yamagiwa, Tadashi Tanimoto, Reiko Hinogami 2008-02-26
7332250 Photomask 2008-02-19
7282309 Photomask, method for producing the same, and method for forming pattern using the photomask 2007-10-16
7250248 Method for forming pattern using a photomask 2007-07-31
7205077 Method for producing photomask and method for producing photomask pattern layout 2007-04-17
7147975 Photomask 2006-12-12
7144684 Method for forming pattern using photomask 2006-12-05
7103870 Method for planning layout for LSI pattern, method for forming LSI pattern and method for generating mask data for LSI Shinji Odanaka 2006-09-05
7060395 Photomask, method for forming the same,and method for designing mask pattern 2006-06-13
7060398 Photomask, method for producing the same, and method for forming pattern using the photomask 2006-06-13
7045255 Photomask and method for producing the same 2006-05-16
7001711 Patterning method using a photomask 2006-02-21
7001694 Photomask and method for producing the same 2006-02-21
6977133 Photomask and pattern forming method Taichi Koizumi 2005-12-20
6703168 Photomask 2004-03-09
6691297 Method for planning layout for LSI pattern, method for forming LSI pattern and method for generating mask data for LSI Shinji Odanaka 2004-02-10
5421934 Dry-etching process simulator Kenji Harafugi, Masafumi Kubbota, Noboru Nomura 1995-06-06
5182718 Method and apparatus for writing a pattern on a semiconductor sample based on a resist pattern corrected for proximity effects resulting from direct exposure of the sample by a charged-particle beam or light Kenji Harafuji, Hiromitsu Hamaguchi, Kenji Kawakita 1993-01-26