Issued Patents All Time
Showing 51–75 of 125 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5876900 | Chemically amplified positive resist composition | Satoshi Watanabe, Shigehiro Nagura, Tsuguo Yamaoka | 1999-03-02 |
| 5849461 | Chemically amplified positive resist composition | Jun Hatakeyama, Shigehiro Nagura, Kiyoshi Motomi, Takeshi Nagata | 1998-12-15 |
| 5847218 | Sulfonium salts and chemically amplified positive resist compositions | Youichi Ohsawa, Satoshi Watanabe, Junji Shimada, Katsuya Takemura, Shigehiro Nagura | 1998-12-08 |
| 5844057 | Polymers and chemically amplified positive resist compositions | Osamu Watanabe, Yoshihumi Takeda, Junji Tsuchiya | 1998-12-01 |
| 5814694 | Anti-reflective coating composition | Satoshi Watanabe, Shigehiro Nagura | 1998-09-29 |
| 5795700 | Method for forming resist pattern with enhanced contrast film | Jun Hatakeyama, Mitsuo Umemura, Satoshi Watanabe | 1998-08-18 |
| 5783717 | Method for purifying organometal compound | Hiromi Ohsaki, Kazuyuki Asakura, Isao Kaneko, Kouhei Satou | 1998-07-21 |
| 5772925 | Anti-reflective coating composition | Satoshi Watanabe, Ichiro Kaneko, Katsuyuki Oikawa, Yoshihumi Takeda | 1998-06-30 |
| 5773200 | Positive resist composition suitable for lift-off technique and pattern forming method | Satoshi Okazaki, Kazuhiro Nishikawa, Masaru Kobayashi, Miki Kobayashi, Mitsuo Umemura | 1998-06-30 |
| 5759739 | Resist composition with polymeric dissolution inhibitor and alkali soluble resin | Katsuya Takemura, Kazumasa Maruyama, Yoshihumi Takeda, Minoru Shigemitsu, Ken'ichi Itoh | 1998-06-02 |
| 5750309 | Chemically amplified positive resist composition | Jun Hatakeyama, Shigehiro Nagura, Kiyoshi Motomi, Takeshi Nagata | 1998-05-12 |
| 5731126 | Chemically amplified positive resist compositions | Katsuya Takemura, Junji Tsuchiya | 1998-03-24 |
| 5728508 | Method of forming resist pattern utilizing fluorinated resin antireflective film layer | Katsuya Takemura, Satoshi Watanabe, Kazumasa Maruyama, Hirofumi Kishita, Kouichi Yamaguchi | 1998-03-17 |
| 5705702 | Method for preparing triarylsulfonium salts | Yoichi Osawa, Satoshi Watanabe, Junji Shimada | 1998-01-06 |
| 5691112 | Sulfonium salt and chemically amplified positive resist composition | Satoshi Watanabe, Youichi Ohsawa, Kazumasa Maruyama, Yoshihumi Takeda, Junji Shimada +2 more | 1997-11-25 |
| 5691396 | Polysiloxane compounds and positive resist compositions | Katsuya Takemura, Junji Tsuchiya, Osamu Watanabe | 1997-11-25 |
| 5633409 | Tristertbutoxyphenyl sulfonium tosylate compound | Satoshi Watanabe, Youichi Ohsawa, Kazumasa Maruyama, Yoshihumi Takeda, Junji Shimada +2 more | 1997-05-27 |
| 5629134 | Chemically amplified positive resist composition | Katsuyuki Oikawa, Fujio Yagihashi, Akinobu Tanaka, Yoshio Kawai, Jiro Nakamura | 1997-05-13 |
| 5624787 | Chemically amplified positive resist composition | Satoshi Watanabe, Katsuyuki Oikawa, Akinobu Tanaka, Tadahito Matsuda, Yoshio Kawai | 1997-04-29 |
| 5612170 | Positive resist composition | Katsuya Takemura, Junji Tsuchiya, Akinobu Tanaka, Yoshio Kawai, Jiro Nakamura | 1997-03-18 |
| 5580936 | Method for preparing partially tert-butoxylated poly(p-hydroxystyrene) | Junji Tsuchiya, Katsuya Takemura, Osamu Watanabe, Yoshihumi Takeda | 1996-12-03 |
| 5569784 | Sulfonium salt and resist composition | Satoshi Watanabe, Junji Shimada, Youichi Ohsawa, Katsuya Takemura, Kazumasa Maruyama | 1996-10-29 |
| 5529888 | Water-soluble film forming composition | Satoshi Watanabe, Yoshihumi Takeda, Katsuyuki Oikawa | 1996-06-25 |
| 5461166 | Chemically adsorbed ultrathin film and its material, and method of manufacturing the same | Norihisa Mino, Kazufumi Ogawa, Mikio Endo, Tohru Kubota, Kazuyuki Asakura | 1995-10-24 |
| 5455360 | 1-pyrrolyl silicon compounds, chemically adsorbed ultrathin film formed therefrom and method of manufacturing the same | Norihisa Mino, Kazufumi Ogawa, Mikio Endo, Tohru Kubota, Katsuya Takemura | 1995-10-03 |