JW

Jun Watanabe

SC Shin-Etsu Chemical Co.: 36 patents #102 of 2,176Top 5%
Ricoh Company: 34 patents #505 of 9,818Top 6%
FU Fujifilm: 22 patents #353 of 4,519Top 8%
SE Seiko Epson: 13 patents #1,445 of 7,774Top 20%
DK Denki Kagaku Kogyo: 10 patents #14 of 655Top 3%
Fujitsu Limited: 7 patents #4,529 of 24,456Top 20%
NC Nihon Micro Coating Co.: 7 patents #4 of 68Top 6%
DL Denka Company Limited: 6 patents #34 of 434Top 8%
Sumitomo Electric Industries: 6 patents #4,612 of 21,551Top 25%
KT Kabushiki Kaisha Toshiba: 6 patents #4,898 of 21,451Top 25%
HC Hodogaya Chemical Co.: 5 patents #65 of 359Top 20%
CL Central Glass Company, Limited: 5 patents #163 of 968Top 20%
DI Daicel Chemical Industries: 4 patents #163 of 893Top 20%
SO Sony: 4 patents #8,966 of 25,231Top 40%
ET Epson Toyocom: 4 patents #4 of 102Top 4%
TI Toray Industries: 4 patents #687 of 3,690Top 20%
SH Shimadzu: 4 patents #448 of 2,007Top 25%
IR Institute Of Physical And Chemical Research: 3 patents #13 of 172Top 8%
DA Daicel: 3 patents #112 of 523Top 25%
NT NTT: 3 patents #1,627 of 4,871Top 35%
Toshiba Memory: 2 patents #853 of 1,971Top 45%
DC Dainippon Screen Mfg. Co.: 2 patents #346 of 977Top 40%
KU Kurimoto: 2 patents #20 of 113Top 20%
Mazda Motor: 2 patents #1,722 of 4,755Top 40%
SC Screen Holdings Co.: 2 patents #326 of 686Top 50%
TK Tanaka Kikinzoku Kogyo K.K.: 2 patents #140 of 436Top 35%
TL Tokyo Electron Limited: 2 patents #2,602 of 5,567Top 50%
TU Tungaloy: 2 patents #42 of 99Top 45%
Canon: 2 patents #12,681 of 19,416Top 70%
PA Panasonic: 2 patents #9,678 of 21,108Top 50%
CC Carl Manufacturing Co.: 1 patents #11 of 21Top 55%
MC Mastsushita Electric Industrial Co.: 1 patents #1 of 26Top 4%
KE Kokusai Electric: 1 patents #344 of 583Top 60%
HO Hoya: 1 patents #757 of 1,290Top 60%
HS Hitachi Systems: 1 patents #37 of 78Top 50%
TC Toyo Communication Equipment Co.: 1 patents #44 of 111Top 40%
HE Hitachi Kokusai Electric: 1 patents #493 of 843Top 60%
TO Tokico: 1 patents #164 of 359Top 50%
EB Ebara: 1 patents #1,014 of 1,611Top 65%
HI Hitachi: 1 patents #17,742 of 28,497Top 65%
NS National Institute For Environmental Studies: 1 patents #4 of 20Top 20%
NU National University Corporation Ehime University: 1 patents #37 of 160Top 25%
MC Mitsui Chemicals: 1 patents #1,270 of 2,279Top 60%
Mitsubishi Electric: 1 patents #15,491 of 25,717Top 65%
MC Matsumoto Yushi-Seiyaku Co.: 1 patents #49 of 113Top 45%
SC Sanshin Co.: 1 patents #5 of 11Top 50%
Overall (All Time): #3,350 of 4,157,543Top 1%
200
Patents All Time

Issued Patents All Time

Showing 151–175 of 200 patents

Patent #TitleCo-InventorsDate
6790586 Resist compositions and patterning process Jun Hatakeyama, Yuji Harada, Yoshio Kawai, Masaru Sasago, Masayuki Endo +5 more 2004-09-14
6730451 Polymers, chemical amplification resist compositions and patterning process Jun Hatakeyama, Yuji Harada 2004-05-04
6710148 Polymers, resist compositions and patterning process Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo +5 more 2004-03-23
6692893 Onium salts, photoacid generators, resist compositions, and patterning process Youichi Ohsawa, Takeshi Nagata, Jun Hatakeyama 2004-02-17
6693746 Anti-glare and anti-reflection film, polarizing plate, and image display device Kazuhiro Nakamura, Ichiro Amimori, Hirohisa Hokazono 2004-02-17
6682869 Chemical amplification, positive resist compositions Youichi Ohsawa, Takanobu Takeda, Akihiro Seki 2004-01-27
6667415 Tertiary butyl 4,4-bis(4′-hydroxyphenyl) pentanoate derivatives and positive resist materials containing the same Fujio Yagihashi, Minoru Takamizawa, Akinobu Tanaka, Yoshio Kawai, Tadahito Matsuda 2003-12-23
6660447 Polymers, resist compositions and patterning process Jun Hatakeyama, Yuji Harada, Masaru Sasago, Masayuki Endo, Shinji Kishimura 2003-12-09
6653044 Chemical amplification type resist composition Takanobu Takeda, Osamu Watanabe, Jun Hatakeyama, Tsunehiro Nishi, Takeshi Kinsho 2003-11-25
6623909 Polymers, resist compositions and patterning process Jun Hatakeyama, Toshiaki Takahashi, Toshinobu Ishihara, Tohru Kubota, Yoshio Kawai 2003-09-23
6605361 Coating composition for lenses and method for producing the same Takanobu Itoh 2003-08-12
6593434 Preparing polyester block copolymer with excess unreacted lactones to be removed 2003-07-15
6594324 Correlation operation method and matched filter Tetsuhiko Miyatani 2003-07-15
6593056 Chemically amplified positive resist composition and patterning method Takanobu Takeda, Katsuya Takemura, Kenji Koizumi 2003-07-15
6582880 Polymers, resist compositions and patterning process Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo +5 more 2003-06-24
6579658 Polymers, resist compositions and patterning process Jun Hatakeyama, Yuji Harada 2003-06-17
6559915 Optical films having matt property, films having a high transmittance, polarizing plates and liquid crystal display devices Ichiro Amimori, Hidetoshi Watanabe, Hiroshi Inoue 2003-05-06
6551758 Onium salts, photoacid generators, resist compositions, and patterning process Youichi Ohsawa, Kazunori Maeda 2003-04-22
6541179 Resist compositions and patterning process Jun Hatakeyama, Youichi Ohsawa, Tsunehiro Nishi 2003-04-01
6511787 Polymers, resist compositions and patterning process Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo +5 more 2003-01-28
6492759 Piezoelectric resonator and a filter 2002-12-10
6465610 Method and apparatus for manufacturing plastic optical element and plastic optical element Hidenobu Kishi, Yasuo Yamanaka, Kiyotaka Sawada, Toshiharu Hatakeyama 2002-10-15
6461790 Polymers, chemical amplification resist compositions and patterning process Jun Hatakeyama, Yuji Harada, Mutsuo Nakashima, Masaru Sasago, Shinji Kishimura 2002-10-08
6461789 Polymers, chemical amplification resist compositions and patterning process Jun Hatakeyama, Yuji Harada 2002-10-08
6461791 Polymers, chemical amplification resist compositions and patterning process Jun Hatakeyama, Yuji Harada, Mutsuo Nakashima 2002-10-08