Issued Patents All Time
Showing 101–114 of 114 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6309524 | Methods and apparatus for processing the surface of a microelectronic workpiece | Daniel J. Woodruff, Thomas H. Oberlitner, Linlin Chen, John M. Pedersen, Vladimir Zila | 2001-10-30 |
| 6303010 | Methods and apparatus for processing the surface of a microelectronic workpiece | Daniel J. Woodruff, Thomas H. Oberlitner, Linlin Chen, John M. Pedersen, Vladimir Zila | 2001-10-16 |
| 6280582 | Reactor vessel having improved cup, anode and conductor assembly | Daniel J. Woodruff | 2001-08-28 |
| 6280583 | Reactor assembly and method of assembly | Daniel J. Woodruff | 2001-08-28 |
| 6270647 | Electroplating system having auxiliary electrode exterior to main reactor chamber for contact cleaning operations | Lyndon Graham, Thomas Ritzdorf, Jeffrey I. Turner | 2001-08-07 |
| 6254742 | Diffuser with spiral opening pattern for an electroplating reactor vessel | Robert A. Weaver, Jerry Simchuk, Raymon F. Thompson | 2001-07-03 |
| 6251692 | Semiconductor processing workpiece support with sensory subsystem for detection of wafers or other semiconductor workpieces | — | 2001-06-26 |
| 6228232 | Reactor vessel having improved cup anode and conductor assembly | Daniel J. Woodruff | 2001-05-08 |
| 6139703 | Cathode current control system for a wafer electroplating apparatus | K. Chris Haugan, Kevin W. Coyle, James Doolittle, Robert W. Berner | 2000-10-31 |
| 6091498 | Semiconductor processing apparatus having lift and tilt mechanism | Mark Dix, Vladimir Zila, Daniel J. Woodruff | 2000-07-18 |
| 6080291 | Apparatus for electrochemically processing a workpiece including an electrical contact assembly having a seal member | Daniel J. Woodruff | 2000-06-27 |
| 6004440 | Cathode current control system for a wafer electroplating apparatus | K. Chris Haugan, Kevin W. Coyle, James Doolittle, Robert W. Berner | 1999-12-21 |
| 6004828 | Semiconductor processing workpiece support with sensory subsystem for detection of wafers or other semiconductor workpieces | — | 1999-12-21 |
| 5985126 | Semiconductor plating system workpiece support having workpiece engaging electrodes with distal contact part and dielectric cover | Martin Bleck, Lyndon Graham | 1999-11-16 |