Issued Patents All Time
Showing 26–37 of 37 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7141494 | Method for reducing tungsten film roughness and improving step coverage | Sang-Hyeob Lee, Karl B. Levy, Aaron R. Fellis, Panya Wongsenakhum, Juwen Gao +3 more | 2006-11-28 |
| 7005372 | Deposition of tungsten nitride | Karl B. Levy, Junghwan Sung, James A. Fair, Joshua Collins, Juwen Gao | 2006-02-28 |
| 6905959 | Apparatus and method for depositing superior Ta (N) copper thin films for barrier and seed applications in semiconductor processing | Maximilian A. Biberger, Erich R. Klawuhn, Kwok Fai Lai, Karl B. Levy, J. Patrick Rymer | 2005-06-14 |
| 6541371 | Apparatus and method for depositing superior Ta(N)/copper thin films for barrier and seed applications in semiconductor processing | Maximilian A. Biberger, Erich R. Klawuhn, Kwok Fai Lai, Karl B. Levy, J. Patrick Rymer | 2003-04-01 |
| 6500321 | Control of erosion profile and process characteristics in magnetron sputtering by geometrical shaping of the sputtering target | Larry D. Hartsough, Richard S. Hill, Karl B. Levy, Robert Martinson | 2002-12-31 |
| 6497796 | Apparatus and method for controlling plasma uniformity across a substrate | Karl B. Levy, Kwok Fai Lai, Andrew L. Nordquist, Larry D. Hartsough | 2002-12-24 |
| 6444105 | Physical vapor deposition reactor including magnet to control flow of ions | Kwok Fai Lai, Andrew L. Nordquist, Larry D. Hartsough, Karl B. Levy | 2002-09-03 |
| 6342133 | PVD deposition of titanium and titanium nitride layers in the same chamber without use of a collimator or a shutter | Gerard C. D'Couto, George Tkach, Jeff Dewayne Lyons, Max Biberger, Kwok Fai Lai +1 more | 2002-01-29 |
| 6193854 | Apparatus and method for controlling erosion profile in hollow cathode magnetron sputter source | Kwok Fai Lai, Larry D. Hartsough, Andrew L. Nordquist, Karl B. Levy, Maximilian A. Biberger | 2001-02-27 |
| 6179973 | Apparatus and method for controlling plasma uniformity across a substrate | Kwok Fai Lai, Andrew L. Nordquist, Larry D. Hartsough, Karl B. Levy | 2001-01-30 |
| 6083363 | Apparatus and method for uniform, low-damage anisotropic plasma processing | James A. Seirmarco | 2000-07-04 |
| 5669975 | Plasma producing method and apparatus including an inductively-coupled plasma source | — | 1997-09-23 |