HN

Hiroyuki Nagasaka

NI Nikon: 104 patents #6 of 2,493Top 1%
NC Nikon Engineering Co.: 17 patents #1 of 8Top 15%
TL Tokyo Electron Limited: 3 patents #2,069 of 5,567Top 40%
Samsung: 3 patents #30,683 of 75,807Top 45%
KL Kenwood Limited: 2 patents #71 of 319Top 25%
KI Kurita Water Industries: 1 patents #167 of 384Top 45%
📍 Gyōda, JP: #3 of 565 inventorsTop 1%
Overall (All Time): #12,226 of 4,157,543Top 1%
109
Patents All Time

Issued Patents All Time

Showing 26–50 of 109 patents

Patent #TitleCo-InventorsDate
9310696 Projection optical system, exposure apparatus, and exposure method Yasuhiro Omura, Takaya Okada 2016-04-12
9285684 Exposure method, exposure apparatus, and method for producing device 2016-03-15
9268237 Exposure method, substrate stage, exposure apparatus, and device manufacturing method Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue +6 more 2016-02-23
9256137 Exposure apparatus, liquid holding method, and device manufacturing method 2016-02-09
9239524 Exposure condition determination method, exposure method, exposure apparatus, and device manufacturing method involving detection of the situation of a liquid immersion region Yoshiki Kida 2016-01-19
9182684 Exposure apparatus, exposure method, and method for producing device Yasufumi Nishii 2015-11-10
9182685 Exposure apparatus, exposure method, method for producing device, and optical part Hiroaki Takaiwa, Shigeru Hirukawa, Ryuichi Hoshika, Hitoshi Ishizawa 2015-11-10
9134621 Exposure apparatus, exposure method, and method for producing device Takeshi Okuyama 2015-09-15
9097988 Exposure apparatus and device manufacturing method Takeshi Okuyama 2015-08-04
9063436 Exposure apparatus, exposure method, and method for producing device Soichi Owa, Ryu Sugawara 2015-06-23
9019469 Exposure apparatus, exposure method, method for producing device, and optical part Hiroaki Takaiwa, Shigeru Hirukawa, Ryuichi Hoshika, Hitoshi Ishizawa 2015-04-28
9019467 Exposure method, substrate stage, exposure apparatus, and device manufacturing method Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue +6 more 2015-04-28
9013675 Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method Yasufumi Nishii, Takeshi Okuyama 2015-04-21
8982322 Exposure apparatus and device manufacturing method 2015-03-17
8891059 Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method 2014-11-18
8879043 Exposure apparatus and method for manufacturing device 2014-11-04
8854601 Projection optical system, exposure apparatus, and exposure method Yasuhiro Omura, Takaya Okada 2014-10-07
8810767 Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device Kenichi Shiraishi, Soichi Owa, Shigeru Hirukawa 2014-08-19
8797505 Exposure apparatus and device manufacturing method Takeshi Okuyama 2014-08-05
8736809 Exposure apparatus, exposure method, and method for producing device Soichi Owa, Yasufumi Nishii 2014-05-27
8724077 Exposure apparatus, exposure method, and device manufacturing method Kenichi Shiraishi, Tomoharu Fujiwara, Soichi Owa, Akihiro Miwa 2014-05-13
8721803 Cleaning liquid, cleaning method, liquid generating apparatus, exposure apparatus, and device fabricating method Hiroshi Morita, Hiroto Tokoshima 2014-05-13
8717533 Exposure apparatus, exposure method, and method for producing device Takeshi Okuyama 2014-05-06
8704999 Exposure apparatus, exposure method, and method for producing device Takeshi Okuyama 2014-04-22
8698998 Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device Kenichi Shiraishi, Soichi Owa, Shigeru Hirukawa 2014-04-15