Issued Patents All Time
Showing 26–42 of 42 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6368912 | Method of fabricating an isolation structure between a vertical transistor and a deep trench capacitor | Chi-Han Chang, Tzu-En He, Hsin-Chuan Tsai | 2002-04-09 |
| 6211006 | Method of forming a trench-type capacitor | Hsin-Chuan Tsai, Yi-Nan Chen | 2001-04-03 |
| 6117726 | Method of making a trench capacitor | Hsin-Chuan Tsai | 2000-09-12 |
| 6100117 | Method for manufacturing DRAM having a redundancy circuit region | Chung-Peng Hao, Chung-Lin Huang, Lee Chung Yuan, Wu-Hsiung Chen | 2000-08-08 |
| 5886320 | Laser ablation with transmission matching for promoting energy coupling to a film stack | Antonio R. Gallo | 1999-03-23 |
| 5872390 | Fuse window with controlled fuse oxide thickness | William A. Klaasen, Alexander Mitwalsky | 1999-02-16 |
| 5834829 | Energy relieving crack stop | Bettina Dinkel, Ernest N. Levine | 1998-11-10 |
| 5798301 | Method of manufacturing metal interconnect structure for an integrated circuit with improved electromigration reliability | Bernd Vollmer, Darryl D. Restaino, Bill Klaasen | 1998-08-25 |
| 5760475 | Refractory metal-titanium nitride conductive structures | John Cronin, Carter W. Kaanta, Michael A. Leach | 1998-06-02 |
| 5641992 | Metal interconnect structure for an integrated circuit with improved electromigration reliability | Bernd Vollmer, Darryl D. Restaino, Bill Klaasen | 1997-06-24 |
| 5608257 | Fuse element for effective laser blow in an integrated circuit device | Frank Prein | 1997-03-04 |
| 5401675 | Method of depositing conductors in high aspect ratio apertures using a collimator | Thomas J. Licata, Thomas L. McDevitt, Paul C. Parries, Scott L. Pennington, James G. Ryan +1 more | 1995-03-28 |
| 5262354 | Refractory metal capped low resistivity metal conductor lines and vias | William J. Cote, Thomas E. Sandwick, Bernd Vollmer, Victor Vynorius, Stuart H. Wolff | 1993-11-16 |
| 5229257 | Process for forming multi-level coplanar conductor/insulator films employing photosensitive polymide polymer compositions | John Cronin, Carter W. Kaanta, Rosemary A. Previti-Kelly, James G. Ryan, Jung Hyuk YOON | 1993-07-20 |
| 5034348 | Process for forming refractory metal silicide layers of different thicknesses in an integrated circuit | Thomas J. Hartswick, Carter W. Kaanta, Terrance M. Wright | 1991-07-23 |
| 4962058 | Process for fabricating multi-level integrated circuit wiring structure from a single metal deposit | John Cronin | 1990-10-09 |
| 4919750 | Etching metal films with complexing chloride plasma | Robert C. Bausmith, William J. Cote, John Cronin, Karey Holland, Carter W. Kaanta +1 more | 1990-04-24 |