Issued Patents All Time
Showing 176–200 of 292 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6214707 | Method of forming a doped region in a semiconductor substrate | Howard E. Rhodes | 2001-04-10 |
| 6207587 | Method for forming a dielectric | Li Li, Richard C. Hawthorne | 2001-03-27 |
| 6204142 | Methods to form electronic devices | — | 2001-03-20 |
| 6204196 | Method of forming a film having enhanced reflow characteristics at low thermal budget | Gurtej S. Sandhu | 2001-03-20 |
| 6200023 | Method for determining the temperature in a thermal processing chamber | Sing-Pin Tay, Yao Zhi Hu | 2001-03-13 |
| 6195163 | Reflectance method for evaluating the surface characteristics of opaque materials | Michael Nuttall, J. Brett Rolfson, Robert Burke | 2001-02-27 |
| 6194327 | Rapid thermal etch and rapid thermal oxidation | Fernando Gonzalez | 2001-02-27 |
| 6194264 | Semiconductor processing method of making a hemispherical grain (HSG) polysilicon layer | Er-Xang Ping | 2001-02-27 |
| 6191443 | Capacitors, methods of forming capacitors, and DRAM memory cells | Husam N. Al-Shareef, Scott DeBoer, F. Daniel Gealy | 2001-02-20 |
| 6190992 | Method to achieve rough silicon surface on both sides of container for enhanced capacitance/area electrodes | Gurtej S. Sandhu | 2001-02-20 |
| 6187628 | Semiconductor processing method of forming hemispherical grain polysilicon and a substrate having a hemispherical grain polysilicon layer | Michael Nuttall, John K. Zahurak, John P. Friedenreich | 2001-02-13 |
| 6180481 | Barrier layer fabrication methods | Scott DeBoer | 2001-01-30 |
| 6174651 | Method for depositing atomized materials onto a substrate utilizing light exposure for heating | — | 2001-01-16 |
| 6174806 | High pressure anneals of integrated circuit structures | John K. Zahurak | 2001-01-16 |
| 6171872 | Method of monitoring a process of manufacturing a semiconductor wafer including hemispherical grain polysilicon | Tyler Lowrey, Klaus Schuegraf | 2001-01-09 |
| 6165833 | Semiconductor processing method of forming a capacitor | Kunal R. Parekh | 2000-12-26 |
| 6162744 | Method of forming capacitors having high-K oxygen containing capacitor dielectric layers, method of processing high-K oxygen containing dielectric layers, method of forming a DRAM cell having having high-K oxygen containing capacitor dielectric layers | Husam N. Al-Shareef, Scott DeBoer | 2000-12-19 |
| 6162666 | Method to form a DRAM capacitor using low temperature reoxidation | Brett Rolfson | 2000-12-19 |
| 6160285 | Polysilicon electrode with increased surface area and method for making same | Klaus F. Schugraf | 2000-12-12 |
| 6159828 | Semiconductor processing method of providing a doped polysilicon layer | Er-Xang Ping | 2000-12-12 |
| 6150265 | Apparatus for forming materials | — | 2000-11-21 |
| 6150706 | Capacitor/antifuse structure having a barrier-layer electrode and improved barrier layer | Garry Mercaldi, Michael Nuttall | 2000-11-21 |
| 6150208 | DRAM capacitors made from silicon-germanium and electrode-limited conduction dielectric films | Scott DeBoer, Klaus Schuegraf, Ronald A. Weimer | 2000-11-21 |
| 6150029 | Method of forming a film having enhanced reflow characteristics at low thermal budget | Gurtej S. Sandhu | 2000-11-21 |
| 6146967 | Selective deposition of amorphous silicon film seeded in a chlorine gas and a hydride gas ambient when forming a stacked capacitor with HSG | James Pan | 2000-11-14 |