Issued Patents All Time
Showing 51–75 of 77 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9187511 | Titanium-aluminum alloy deposition with titanium-tetrahydroaluminate bimetallic molecules | Julien Gatineau, Satoko Gatineau, Changhee Ko | 2015-11-17 |
| 9073952 | Synthesis method for carbosilanes | Zhiwen Wan, Ziyun Wang, Ashutosh Misra, Andrey V. Korolev | 2015-07-07 |
| 8859797 | Synthesis methods for carbosilanes | Zhiwen Wan, Ziyun Wang, Ashulosh Misra, Claudia Fafard, Andrey V. Korolev | 2014-10-14 |
| 8853075 | Method for forming a titanium-containing layer on a substrate using an atomic layer deposition (ALD) process | Satoko Gatineau, Christian Dussarrat, Christophe Lachaud, Nicolas Blasco, Audrey Pinchart +2 more | 2014-10-07 |
| 8367531 | Aluminum implant using new compounds | Vincent M. Omarjee, Christian Dussarrat, Nicolas Blasco | 2013-02-05 |
| 8357430 | Method for producing silicon nitride films | Christian Dussarrat, Takako Kimura | 2013-01-22 |
| 8343860 | High C content molecules for C implant | Vincent M. Omarjee, Christian Dussarrat, Nicolas Blasco | 2013-01-01 |
| 7487806 | Source liquid supply apparatus having a cleaning function | Olivier Letessier, Masao Kimura, Akinobu Nasu | 2009-02-10 |
| 7482286 | Method for forming dielectric or metallic films | Ashutosh Misra, Matthew Fisher, Benjamin Jurcik, Christian Dussarrat, Eri Tsukada | 2009-01-27 |
| 7293569 | Alkylsilanes as solvents for low vapor pressure precursors | Ravi Laxman, Ashutosh Misra | 2007-11-13 |
| 7192626 | Methods for producing silicon nitride films and silicon oxynitride films by thermal chemical vapor deposition | Christian Dussarrat, Takako Kimura, Naoki Tamaoki, Yuusuke Sato | 2007-03-20 |
| 7064083 | Hexakis(monohydrocarbylamino)disilanes and method for the preparation thereof | Christian Dussarrat | 2006-06-20 |
| 7019159 | Hexakis(monohydrocarbylamino) disilanes and method for the preparation thereof | Christian Dussarrat | 2006-03-28 |
| 6936548 | Method for depositing silicon nitride films and silicon oxynitride films by chemical vapor deposition | Christian Dussarrat | 2005-08-30 |
| 6810897 | Process gas supply mechanism for ALCVD systems | Takako Kimura | 2004-11-02 |
| 6656255 | Copper source liquid for MOCVD processes and method for the preparation thereof | Akinobu Nasu | 2003-12-02 |
| 6499502 | Method and device for filling a distribution line with corrosive gas | James McAndrew, Eric Duchateau, Bertrand Lefevre | 2002-12-31 |
| 6442736 | Semiconductor processing system and method for controlling moisture level therein | Benjamin Jurcik, Jean-Michel Friedt, James McAndrew | 2002-08-27 |
| 6341521 | Process and device for measuring the amount of impurities in a gas sample to be analyzed | Mélanie Bartolomey, Patrick Mauvais, James McAndrew | 2002-01-29 |
| 6328801 | Method and system for recovering and recirculating a deuterium-containing gas | Daniel Gary, Jean-Christophe Rostaing, Jean-Marie Friedt | 2001-12-11 |
| 6082398 | Device for regulating the flow of gases having substantially different molar masses | Alain Mail, Yves Marot | 2000-07-04 |
| 5937886 | Method and device for delivering a pure gas charged with a predetermined quantity of at least one gaseous impurity to an apparatus | Alain Mail, Yves Marot | 1999-08-17 |
| 5928415 | Selection device for providing one or the other of two gases to an apparatus | Alain Mail, Yves Marot | 1999-07-27 |
| 5922286 | Device for delivering any one of a plurality of gases to an apparatus | Alain Mail, Yves Marot | 1999-07-13 |
| 5900214 | Device for delivering any one of a plurality of gases to an apparatus | Alain Mail, Yves Marot | 1999-05-04 |