Issued Patents All Time
Showing 26–50 of 55 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8703004 | Method for chemical planarization and chemical planarization apparatus | Masako Kodera, Hiroshi Tomita, Gaku Minamihaba, Akifumi GAWASE | 2014-04-22 |
| 8685857 | Chemical mechanical polishing method of organic film and method of manufacturing semiconductor device | Gaku Minamihaba, Yoshikuni Tateyama, Hiroyuki Yano, Atsushi Shigeta | 2014-04-01 |
| 8575030 | Semiconductor device manufacturing method | Gaku Minamihaba, Nobuyuki Kurashima, Hajime Eda | 2013-11-05 |
| 8480915 | Method of manufacturing semiconductor device | Gaku Minamihaba | 2013-07-09 |
| 8119517 | Chemical mechanical polishing method and method of manufacturing semiconductor device | Hirotaka Shida, Atsushi Shigeta, Shinichi Hirasawa, Hirokazu Kato, Masako Kinoshita +2 more | 2012-02-21 |
| 8114776 | Method of manufacturing semiconductor device | Hajime Eda, Atsushi Shigeta, Takatoshi Ono, Satoko Seta | 2012-02-14 |
| 7985685 | Method of manufacturing semiconductor device | Masako Kinoshita, Seiro Miyoshi, Yoshikuni Tateyama, Takeshi Nishioka, Hiroyuki Yano | 2011-07-26 |
| 7888139 | Fabricating method of nonvolatile semiconductor storage apparatus | Takeo Kubota, Yoshikuni Tateyama, Hiroyuki Kanaya, Yoshihiro Minami | 2011-02-15 |
| 7833431 | Aqueous dispersion for CMP, polishing method and method for manufacturing semiconductor device | Gaku Minamihaba, Nobuyuki Kurashima, Dai Fukushima, Susumu Yamamoto, Hiroyuki Yano | 2010-11-16 |
| 7829406 | Method of manufacturing semiconductor device | Shunsuke Doi | 2010-11-09 |
| 7700489 | Method of manufacturing a semiconductor device | Gaku Minamihaba, Hiroyuki Yano, Atsushi Shigeta | 2010-04-20 |
| 7459398 | Slurry for CMP, polishing method and method of manufacturing semiconductor device | Gaku Minamihaba, Hiroyuki Yano | 2008-12-02 |
| 7452819 | Chemical mechanical polishing method of organic film and method of manufacturing semiconductor device | Gaku Minamihaba, Yoshikuni Tateyama, Hiroyuki Yano, Atsushi Shigeta | 2008-11-18 |
| 7435682 | Method of manufacturing semiconductor device | Gaku Minamihaba, Atsushi Shigeta, Hiroyuki Yano, Satoko Seta, Hirokazu Kato | 2008-10-14 |
| 7416942 | Method for manufacturing semiconductor device | Shinichi Hirasawa, Atsushi Shigeta, Kiyotaka Miyano, Takeshi Nishioka, Hiroyuki Yano | 2008-08-26 |
| 7402521 | Method for chemically mechanically polishing organic film, method of manufacturing semiconductor device, and program therefor | Gaku Minamihaba, Atsushi Shigeta, Hiroyuki Yano | 2008-07-22 |
| 7332104 | Slurry for CMP, polishing method and method of manufacturing semiconductor device | Gaku Minamihaba, Hiroyuki Yano | 2008-02-19 |
| 7186654 | Chemical mechanical polishing slurry and method of manufacturing semiconductor device by using the same | — | 2007-03-06 |
| 7166017 | Slurry for CMP, polishing method and method of manufacturing semiconductor device | Gaku Minamihaba, Hiroyuki Yano | 2007-01-23 |
| 7071108 | Chemical mechanical polishing slurry containing abrasive particles exhibiting photocatalytic function | Gaku Minamihaba, Hiroyuki Yano | 2006-07-04 |
| 7060621 | Slurry for CMP, polishing method and method of manufacturing semiconductor device | Gaku Minamihaba, Hiroyuki Yano | 2006-06-13 |
| 7052620 | Polishing slurry for aluminum-based metal, and method of manufacturing semiconductor device | Gaku Minamihaba | 2006-05-30 |
| 6935928 | Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method | Kazuhito Uchikura, Kazuo Nishimoto, Masayuki Hattori, Nobuo Kawahashi, Hiroyuki Yano +3 more | 2005-08-30 |
| 6875088 | Polishing member and method of manufacturing semiconductor device | Hiroyuki Yano | 2005-04-05 |
| 6858539 | Post-CMP treating liquid and method for manufacturing semiconductor device | Gaku Minamihaba, Nobuyuki Kurashima, Hiroyuki Yano | 2005-02-22 |