Issued Patents All Time
Showing 26–49 of 49 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9040221 | Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound | Hitoshi Osaki, Yusuke Asano, Mitsuo Sato | 2015-05-26 |
| 8968458 | Composition for resist underlayer film and process for producing same | Keiji Konno, Masato Tanaka, Momoko Ishii, Junichi Takahashi | 2015-03-03 |
| 8808446 | Composition for resist underlayer film and process for producing same | Keiji Konno, Masato Tanaka, Momoko Ishii, Junichi Takahashi | 2014-08-19 |
| 8722306 | Radiation-sensitive resin composition | Hirokazu Sakakibara, Makoto Shimizu, Takehiko Naruoka, Yoshifumi Oizumi | 2014-05-13 |
| 8647810 | Resist lower layer film-forming composition, polymer, resist lower layer film, pattern-forming method, and method of producing semiconductor device | Kazuo Nakahara | 2014-02-11 |
| 8440384 | Compound, salt, and radiation-sensitive resin composition | Takuma Ebata | 2013-05-14 |
| 8273837 | Compound, polymer, and resin composition | Takuma Ebata, Nobuji Matsumura | 2012-09-25 |
| 8211624 | Method for pattern formation and resin composition for use in the method | Atsushi Nakamura, Tsutomu Shimokawa, Junichi Takahashi, Takayoshi Abe, Tomohiro Kakizawa | 2012-07-03 |
| 8206888 | Radiation-sensitive resin composition | Yuuji Yada | 2012-06-26 |
| 8026039 | Radiation-sensitive resin composition | Takuma Ebata, Makoto Shimizu | 2011-09-27 |
| 7956142 | Polymerizable sulfonic acid onium salt and resin | Takuma Ebata, Makoto Shimizu, Jonathan Joachim Jodry, Satoru Narizuka, Masaki Fujiwara | 2011-06-07 |
| 7897821 | Sulfonium compound | Eiji Yoneda, Takuma Ebata, Takanori Kawakami, Makoto Sugiura, Tsutomu Shimokawa +1 more | 2011-03-01 |
| 7812105 | Compound, polymer, and radiation-sensitive composition | Eiji Yoneda, Takuma Ebata, Takanori Kawakami, Makoto Sugiura, Tsutomu Shimokawa +1 more | 2010-10-12 |
| 7488566 | Positive type radiation-sensitive resin composition | Takayuki Tsuji, Kentarou Harada, Daisuke Shimizu | 2009-02-10 |
| 7335457 | Positive-tone radiation-sensitive resin composition | Daisuke Shimizu, Yuuji Yada, Kentarou Gotou | 2008-02-26 |
| 7314701 | Radiation-sensitive resin composition | Kenichi Yokoyama, Fumihisa Miyajima, Eiji Yoneda | 2008-01-01 |
| 7258962 | Positive-tone radiation-sensitive resin composition | Takayuki Tsuji | 2007-08-21 |
| 7202016 | Radiation-sensitive resin composition | Masaaki Miyaji, Yuji Yada, Jun Numata, Yukio Nishimura, Masafumi Yamamoto +3 more | 2007-04-10 |
| 7105269 | Copolymer, polymer mixture, and radiation-sensitive resin composition | Daisuke Shimizu, Tsutomu Shimokawa, Fumihisa Miyajima, Masaaki Miyaji | 2006-09-12 |
| 6933094 | Radiation-sensitive resin composition | Masaaki Miyaji, Yuji Yada, Jun Numata, Yukio Nishimura, Masafumi Yamamoto +3 more | 2005-08-23 |
| 6908722 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | Satoshi Ebata, Eiji Yoneda, Tatsuya Toneri, Yong Wang, Haruo Iwasawa +1 more | 2005-06-21 |
| 6846607 | Carbazole derivative and chemically amplified radiation-sensitive resin composition | Jun Numata, Shirou Kusumoto, Eiichi Kobayashi | 2005-01-25 |
| 6830868 | Anthracene derivative and radiation-sensitive resin composition | Tsutomu Shimokawa | 2004-12-14 |
| 6821705 | Radiation-sensitive resin composition | Jun Numata, Eiichi Kobayashi, Tsutomu Shimokawa | 2004-11-23 |