Issued Patents All Time
Showing 25 most recent of 52 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11681222 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | Hiroki Nakagawa, Hiromitsu Nakashima, Gouji Wakamatsu, Kentarou Gotou, Takeo Shioya | 2023-06-20 |
| 11036133 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | Hiroki Nakagawa, Hiromitsu Nakashima, Gouji Wakamatsu, Kentarou Gotou, Takeo Shioya | 2021-06-15 |
| 10620534 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | Hiroki Nakagawa, Hiromitsu Nakashima, Gouji Wakamatsu, Kentarou Gotou, Takeo Shioya | 2020-04-14 |
| 10478085 | Apparatus for acquiring electric activity in the brain and utilization of the same | Atsushi Nambu, Satomi Chiken, Sayuki Takara | 2019-11-19 |
| 10302721 | Magnetic resonance measurement apparatus with improved instruction sequence transfer | Kenichi Hachitani, Kenya Izumi, Takayuki Suzuki | 2019-05-28 |
| 10082733 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | Hiroki Nakagawa, Hiromitsu Nakashima, Gouji Wakamatsu, Kentarou Gotou, Takeo Shioya | 2018-09-25 |
| 9598520 | Radiation-sensitive resin composition, polymer and method for forming a resist pattern | Yuko Kiridoshi, Takehiko Naruoka, Yusuke Asano, Takanori Kawakami, Hiromitsu Nakashima | 2017-03-21 |
| 9500950 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | Hiroki Nakagawa, Hiromitsu Nakashima, Gouji Wakamatsu, Kentarou Gotou, Takeo Shioya | 2016-11-22 |
| 9261789 | Liquid immersion lithography upper-layer film-forming composition and photoresist pattern-forming method | Takahiro Hayama, Kazunori Kusabiraki, Ken MARUYAMA, Kiyoshi Tanaka | 2016-02-16 |
| 9213236 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | Hiroki Nakagawa, Hiromitsu Nakashima, Gouji Wakamatsu, Kentarou Gotou, Takeo Shioya | 2015-12-15 |
| 9182674 | Immersion upper layer film forming composition and method of forming photoresist pattern | Toru Kimura, Tomohiro Utaka, Hiroaki Nemoto, Atsushi Nakamura, Takashi Chiba +1 more | 2015-11-10 |
| 8895229 | Composition for formation of upper layer film, and method for formation of photoresist pattern | Norihiko Sugie, Hiromitsu Nakashima, Norihiro Natsume, Daita Kouno | 2014-11-25 |
| 8808974 | Method for forming pattern | Kaori Sakai, Nobuji Matsumura, Makoto Sugiura, Atsushi Nakamura, Gouji Wakamatsu +1 more | 2014-08-19 |
| 8802348 | Radiation-sensitive resin composition | Noboru Otsuka, Takanori Kawakami, Makoto Sugiura | 2014-08-12 |
| 8791020 | Silicon-containing film, resin composition, and pattern formation method | Takashi Mori, Masato Tanaka, Yoshikazu Yamaguchi | 2014-07-29 |
| 8697344 | Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern | Daita Kouno, Norihiko Sugie, Gouji Wakamatsu, Norihiro Natsume, Makoto Sugiura | 2014-04-15 |
| 8697343 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | Hiroki Nakagawa, Hiromitsu Nakashima, Gouji Wakamatsu, Kentarou Harada, Takeo Shioya | 2014-04-15 |
| 8697331 | Compound, polymer, and radiation-sensitive composition | Hirokazu Sakakibara, Takehiko Naruoka, Makoto Shimizu, Nobuji Matsumura, Yuusuke Asano | 2014-04-15 |
| 8572428 | Storage apparatus and control method for storage apparatus | Satoru Nishita | 2013-10-29 |
| 8530692 | Compound, fluorine-containing polymer, radiation-sensitive resin composition and method for producing compound | Nobuji Matsumura, Yuusuke Asano, Hirokazu Sakakibara, Takehiko Naruoka | 2013-09-10 |
| 8507575 | Radiation-sensitive resin composition, polymer, and compound | Nobuji Matsumura, Akimasa Soyano, Ryuichi SERIZAWA, Noboru Otsuka, Hiroshi Tomioka | 2013-08-13 |
| 8507189 | Upper layer film forming composition and method of forming photoresist pattern | Daita Kouno, Hiromitsu Nakashima | 2013-08-13 |
| 8435718 | Upper layer-forming composition and photoresist patterning method | Atsushi Nakamura, Hiroki Nakagawa, Hiromitsu Nakashima, Takayuki Tsuji, Hiroshi Dougauchi +1 more | 2013-05-07 |
| 8431332 | Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern | Daita Kouno, Norihiko Sugie, Gouji Wakamatsu, Norihiro Natsume, Makoto Sugiura | 2013-04-30 |
| 8307141 | Multi-core processor, control method thereof, and information processing apparatus | Satoru Nishita | 2012-11-06 |