Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8125034 | Graded ARC for high NA and immersion lithography | Martin Jay Seamons, Matthew Spuller, Sum-Yee Betty Tang, Kwangduk Douglas Lee, Sudha Rathi | 2012-02-28 |
| 7776516 | Graded ARC for high NA and immersion lithography | Martin Jay Seamons, Matthew Spuller, Sum-Yee Betty Tang, Kwangduk Douglas Lee, Sudha Rathi | 2010-08-17 |
| 7737040 | Method of reducing critical dimension bias during fabrication of a semiconductor device | Christopher Dennis Bencher, Melvin Montgomery, Alexander Buxbaum, Yung-Hee Yvette Lee, Jian Ding +1 more | 2010-06-15 |
| 7718081 | Techniques for the use of amorphous carbon (APF) for various etch and litho integration schemes | Wei Liu, Jim Zhongyi He, Sang-Hoon Ahn, Meihua Shen, Hichem M'Saad +1 more | 2010-05-18 |
| 7642195 | Hydrogen treatment to improve photoresist adhesion and rework consistency | — | 2010-01-05 |
| 7407893 | Liquid precursors for the CVD deposition of amorphous carbon films | Martin Jay Seamons, Sudha Rathi, Deenesh Padhi, Andy Luan, Sum-Yee Betty Tang +6 more | 2008-08-05 |
| 7365014 | Reticle fabrication using a removable hard mask | Christopher Dennis Bencher, Melvin Montgomery, Alexander Buxbaum, Yung-Hee Yvette Lee, Jian Ding +1 more | 2008-04-29 |
| 7262106 | Absorber layer for DSA processing | Luc Van Autryve, Chris Bencher, Dean Jennings, Haifan Liang, Abhilash J. Mayur +2 more | 2007-08-28 |
| 7109087 | Absorber layer for DSA processing | Luc Van Autryve, Chris Bencher, Dean Jennings, Haifan Liang, Abhilash J. Mayur +2 more | 2006-09-19 |
| 7105442 | Ashable layers for reducing critical dimensions of integrated circuit features | Hongching Shan, Kenny L. Doan, Jingbao Liu, Michael Barnes, Hong Dang Nguyen +4 more | 2006-09-12 |
| 7094442 | Methods for the reduction and elimination of particulate contamination with CVD of amorphous carbon | Martin Jay Seamons, Sudha Rathi, Heraldo Botelho | 2006-08-22 |
| 7064078 | Techniques for the use of amorphous carbon (APF) for various etch and litho integration scheme | Wei Liu, Jim Zhongyi He, Sang-Hoon Ahn, Meihua Shen, Hichem M'Saad +1 more | 2006-06-20 |
| 6853043 | Nitrogen-free antireflective coating for use with photolithographic patterning | Sang-Hoon Ahn, Christopher Dennis Bencher, Hichem M'Saad, Sudha Rathi | 2005-02-08 |