| 10553398 |
Power deposition control in inductively coupled plasma (ICP) reactors |
Samer Banna, Tza-Jing Gung, Vladimir Knyazik, Kyle Tantiwong, Dan Marohl +1 more |
2020-02-04 |
| 10083816 |
Shielded lid heater assembly |
Michael D. Willwerth, David Palagashvili, Valentin N. Todorow |
2018-09-25 |
| 9362148 |
Shielded lid heater assembly |
Michael D. Willwerth, David Palagashvili, Valentin N. Todorow |
2016-06-07 |
| 8956500 |
Methods to eliminate “M-shape” etch rate profile in inductively coupled plasma reactor |
Kyeong-Tae Lee, Valentin N. Todorow, Tae Won Kim, Anisul Khan, Shashank Deshmukh |
2015-02-17 |
| 8497876 |
Infinite complexity deep-framebuffer rendering |
Eric Tabellion |
2013-07-30 |
| 8419893 |
Shielded lid heater assembly |
Michael D. Willwerth, David Palagashvili, Valentin N. Todorow |
2013-04-16 |
| 8408758 |
Recessed luminaire |
Anthony G. Patti, Peter F. Thornton, Jr., David E. Doubek |
2013-04-02 |
| 8100565 |
Recessed luminaire |
Anthony G. Patti, Peter F. Thornton, Jr., David E. Doubek |
2012-01-24 |
| 8022641 |
Recessed LED down light |
Raymond George Janik, Michael T. Thornton, David E. Doubek, Peter F. Thornton, Jr. |
2011-09-20 |
| D633621 |
Leadwear assembly |
Andrew P. Muser, Kalmer D. Hendry |
2011-03-01 |
| 7748868 |
Recessed luminaire |
Anthony G. Patti, Peter F. Thornton, Jr., David E. Doubek |
2010-07-06 |
| 6905800 |
Etching a substrate in a process zone |
Mohit Jain, Thorsten Lill |
2005-06-14 |
| 6677242 |
Integrated shallow trench isolation approach |
Wei Liu, Scott Williams, David Mui |
2004-01-13 |
| 6566270 |
Integration of silicon etch and chamber cleaning processes |
Wei Liu, Scott Williams, David Mui, Meihua Shen |
2003-05-20 |
| 6431723 |
Recessed lighting fixture |
John S. Schubert, James Beresford Lee, Alice M. Jandrisits, David E. Doubek |
2002-08-13 |
| 6358147 |
Gaming machine with multiple payoff modes and award presentation schemes |
Joel R. Jaffe |
2002-03-19 |
| 6343873 |
Lighting fixture with downlight reflector and wallwash reflector |
Victor Eberhard, John S. Schubert |
2002-02-05 |
| 6322714 |
Process for etching silicon-containing material on substrates |
Padmapani Nallan, Jeffrey D. Chinn |
2001-11-27 |
