SB

Sean D. Burns

IBM: 65 patents #1,172 of 70,183Top 2%
TE Tessera: 7 patents #62 of 271Top 25%
AS Adeia Semiconductor Solutions: 1 patents #22 of 57Top 40%
Globalfoundries: 1 patents #2,221 of 4,424Top 55%
Overall (All Time): #26,198 of 4,157,543Top 1%
74
Patents All Time

Issued Patents All Time

Showing 25 most recent of 74 patents

Patent #TitleCo-InventorsDate
12322601 Alternating hardmasks for tight-pitch line formation Nelson Felix, Chi-Chun Liu, Yann Mignot, Stuart A. Sieg 2025-06-03
12106963 Self aligned pattern formation post spacer etchback in tight pitch configurations Lawrence A. Clevenger, Matthew E. Colburn, Nelson Felix, Sivananda K. Kanakasabapathy, Christopher J. Penny +2 more 2024-10-01
11670510 Self aligned pattern formation post spacer etchback in tight pitch configurations Lawrence A. Clevenger, Matthew E. Colburn, Nelson Felix, Sivananda K. Kanakasabapathy, Christopher J. Penny +2 more 2023-06-06
11646221 Self-aligned pattern formation for a semiconductor device Lawrence A. Clevenger, Nelson Felix, Sivananda K. Kanakasabapathy, Christopher J. Penny, Nicole Saulnier 2023-05-09
11610780 Alternating hardmasks for tight-pitch line formation Nelson Felix, Chi-Chun Liu, Yann Mignot, Stuart A. Sieg 2023-03-21
11302533 Selective gas etching for self-aligned pattern transfer John C. Arnold, Yann Mignot, Yongan Xu 2022-04-12
11301748 Automatic feature extraction from aerial images for test pattern sampling and pattern coverage inspection for lithography Jing Sha, Martin Burkhardt 2022-04-12
11227793 Self-aligned pattern formation for a semiconductor device Lawrence A. Clevenger, Nelson Felix, Sivananda K. Kanakasabapathy, Christopher J. Penny, Nicole Saulnier 2022-01-18
11031248 Alternating hardmasks for tight-pitch line formation Nelson Felix, Chi-Chun Liu, Yann Mignot, Stuart A. Sieg 2021-06-08
11018007 Self aligned pattern formation post spacer etchback in tight pitch configurations Lawrence A. Clevenger, Matthew E. Colburn, Nelson Felix, Sivananda K. Kanakasabapathy, Christopher J. Penny +2 more 2021-05-25
10957583 Self-aligned quadruple patterning (SAQP) for routing layouts including multi-track jogs Lawrence A. Clevenger, Matthew E. Colburn, Sivananda K. Kanakasabapathy, Yann Mignot, Christopher J. Penny +2 more 2021-03-23
10930504 Selective gas etching for self-aligned pattern transfer John C. Arnold, Yann Mignot, Yongan Xu 2021-02-23
10613438 Self-aligned patterning methods which implement directed self-assembly Sivananda K. Kanakasabapathy, Kafai Lai, Chi-Chun Liu, Kristin Schmidt, Ankit Vora 2020-04-07
10614877 4T static random access memory bitcell retention Albert M. Chu, Myung-Hee Na, Robert C. Wong, Jens Haetty 2020-04-07
10559467 Selective gas etching for self-aligned pattern transfer John C. Arnold, Yann Mignot, Yongan Xu 2020-02-11
10546774 Self-aligned quadruple patterning (SAQP) for routing layouts including multi-track jogs Lawrence A. Clevenger, Matthew E. Colburn, Sivananda K. Kanakasabapathy, Yann Mignot, Christopher J. Penny +2 more 2020-01-28
10539881 Generation of hotspot-containing physical design layout patterns Jing Sha, Dongbing Shao, Martin Burkhardt 2020-01-21
10529569 Self aligned pattern formation post spacer etchback in tight pitch configurations Lawrence A. Clevenger, Matthew E. Colburn, Nelson Felix, Sivananda K. Kanakasabapathy, Christopher J. Penny +2 more 2020-01-07
10410875 Alternating hardmasks for tight-pitch line formation Nelson Felix, Chi-Chun Liu, Yann Mignot, Stuart A. Sieg 2019-09-10
10395985 Self aligned conductive lines with relaxed overlay Lawrence A. Clevenger, Matthew E. Colburn, Sivananda K. Kanakasabapathy, Yann Mignot, Christopher J. Penny +2 more 2019-08-27
10388525 Multi-angled deposition and masking for custom spacer trim and selected spacer removal Marc A. Bergendahl, Lawrence A. Clevenger, Christopher J. Penny, Michael Rizzolo 2019-08-20
10381068 Ultra dense and stable 4T SRAM cell design having NFETs and PFETs Myung-Hee Na, Robert C. Wong, Jens Haetty 2019-08-13
10361079 Multi-angled deposition and masking for custom spacer trim and selected spacer removal Marc A. Bergendahl, Lawrence A. Clevenger, Christopher J. Penny, Michael Rizzolo 2019-07-23
10312103 Alternating hardmasks for tight-pitch line formation Nelson Felix, Chi-Chun Liu, Yann Mignot, Stuart A. Sieg 2019-06-04
10121661 Self aligned pattern formation post spacer etchback in tight pitch configurations Lawrence A. Clevenger, Matthew E. Colburn, Nelson Felix, Sivananda K. Kanakasabapathy, Christopher J. Penny +2 more 2018-11-06