| 11715620 |
Tuning gas cluster ion beam systems |
Matthew C. Gwinn, Kenneth Regan |
2023-08-01 |
| 10861674 |
Compensated location specific processing apparatus and method |
Matthew C. Gwinn, Kenneth Regan, Allen J. Leith, Michael Graf |
2020-12-08 |
| 10497540 |
Compensated location specific processing apparatus and method |
Matthew C. Gwinn, Kenneth Regan, Allen J. Leith, Michael Graf |
2019-12-03 |
| 9324567 |
Gas cluster ion beam etching process for etching Si-containing, Ge-containing, and metal-containing materials |
Christopher K. Olsen, Yan Shao, Ruairidh MacCrimmon, Luis Fernandez |
2016-04-26 |
| 8981322 |
Multiple nozzle gas cluster ion beam system |
Matthew C. Gwinn, Robert K. Becker, Avrum Freytsis, Michael Graf |
2015-03-17 |
| 8557710 |
Gas cluster ion beam etching process for metal-containing materials |
Yan Shao, Christopher K. Olsen, Ruairidh MacCrimmon |
2013-10-15 |
| 8512586 |
Gas cluster ion beam etching process for achieving target etch process metrics for multiple materials |
Christopher K. Olsen, Yan Shao, Ruairidh MacCrimmon |
2013-08-20 |
| 8513138 |
Gas cluster ion beam etching process for Si-containing and Ge-containing materials |
Yan Shao, Christopher K. Olsen, Ruairidh MacCrimmon |
2013-08-20 |
| 8455060 |
Method for depositing hydrogenated diamond-like carbon films using a gas cluster ion beam |
— |
2013-06-04 |
| 8304033 |
Method of irradiating substrate with gas cluster ion beam formed from multiple gas nozzles |
Matthew C. Gwinn, Robert K. Becker, Avrum Freytsis, Michael Graf |
2012-11-06 |
| 8202435 |
Method for selectively etching areas of a substrate using a gas cluster ion beam |
— |
2012-06-19 |
| 8097860 |
Multiple nozzle gas cluster ion beam processing system and method of operating |
Matthew C. Gwinn, Robert K. Becker, Avrum Freytsis, Michael Graf |
2012-01-17 |
| 7905199 |
Method and system for directional growth using a gas cluster ion beam |
John Hautala |
2011-03-15 |
| 7642531 |
Apparatus and method for reducing particulate contamination in gas cluster ion beam processing equipment |
Matthew C. Gwinn |
2010-01-05 |
| 7410890 |
Formation of doped regions and/or ultra-shallow junctions in semiconductor materials by gas-cluster ion irradiation |
Allen R. Kirkpatrick, Sean R. Kirkpatrick, Thomas G. Tetreault, John O. Borland, John Hautala +1 more |
2008-08-12 |
| 7259036 |
Methods of forming doped and un-doped strained semiconductor materials and semiconductor films by gas-cluster-ion-beam irradiation and materials and film products |
John O. Borland, John Hautala, Wesley Skinner |
2007-08-21 |
| 7060989 |
Method and apparatus for improved processing with a gas-cluster ion beam |
David Swenson, John Hautala, Michael E. Mack, Matthew C. Gwinn |
2006-06-13 |
| 5607601 |
Method for patterning and etching film layers of semiconductor devices |
Gary L. Loper |
1997-03-04 |