MN

Masahiro Nei

NI Nikon: 23 patents #159 of 2,493Top 7%
Overall (All Time): #182,266 of 4,157,543Top 5%
23
Patents All Time

Issued Patents All Time

Showing 1–23 of 23 patents

Patent #TitleCo-InventorsDate
11854288 Image determining device to determine the state of a subject Tetsuya Yamamoto, Isao Totsuka, Tomoyuki Matsuyama, Masamitsu Yanagihara, Satoshi Hagiwara +1 more 2023-12-26
11055522 Image determining device to determine the state of a subject Tetsuya Yamamoto, Isao Totsuka, Tomoyuki Matsuyama, Masamitsu Yanagihara, Satoshi Hagiwara +1 more 2021-07-06
10275645 Image determining device to determine the state of a subject Tetsuya Yamamoto, Isao Totsuka, Tomoyuki Matsuyama, Masamitsu Yanagihara, Satoshi Hagiwara +1 more 2019-04-30
10255491 Guidance system, detection device, and position assessment device Masakazu Sekiguchi, Tetsuya Yamamoto, Masamitsu Yanagihara, Satoshi Hagiwara, Isao Totsuka +1 more 2019-04-09
9846371 Exposure method, substrate stage, exposure apparatus, and device manufacturing method Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue +6 more 2017-12-19
9268237 Exposure method, substrate stage, exposure apparatus, and device manufacturing method Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue +6 more 2016-02-23
9047751 Image determining device to determine the state of a subject Tetsuya Yamamoto, Isao Totsuka, Tomoyuki Matsuyama, Masamitsu Yanagihara, Satoshi Hagiwara +1 more 2015-06-02
9019467 Exposure method, substrate stage, exposure apparatus, and device manufacturing method Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue +6 more 2015-04-28
8780326 Exposure apparatus, exposure method, and device manufacturing method Tohru Kiuchi, Takeyuki Mizutani, Masato Hamatani, Masahiko Okumura 2014-07-15
8384880 Exposure method, substrate stage, exposure apparatus, and device manufacturing method Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue +6 more 2013-02-26
8208117 Exposure method, substrate stage, exposure apparatus, and device manufacturing method Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue +6 more 2012-06-26
8089611 Exposure apparatus and method for producing device Naoyuki Kobayashi 2012-01-03
7834976 Exposure apparatus and method for producing device Naoyuki Kobayashi 2010-11-16
7817244 Exposure apparatus and method for producing device Naoyuki Kobayashi, Hiroshi Chiba, Shigeru Hirukawa 2010-10-19
7589820 Exposure apparatus and method for producing device Naoyuki Kobayashi, Dai Arai, Soichi Owa 2009-09-15
7242455 Exposure apparatus and method for producing device Naoyuki Kobayashi, Hiroshi Chiba, Shigeru Hirukawa 2007-07-10
6813004 Exposure method, exposure apparatus and making method of the apparatus, and device and manufacturing method of the device Takahiro Horikoshi, Takahisa Kikuchi 2004-11-02
6549271 Exposure apparatus and method Masahiko Yasuda, Yuuki Ishii, Tetsuo Taniguchi 2003-04-15
6492649 Projection exposure apparatus, projection exposure method, optical cleaning method and method of fabricating semiconductor device Taro Ogata 2002-12-10
6342941 Exposure apparatus and method preheating a mask before exposing; a conveyance method preheating a mask before exposing; and a device manufacturing system and method manufacturing a device according to the exposure apparatus and method Kenichiro Kaneko, Hiroki Tateno, Jiro Inoue, Naomasa Shiraishi 2002-01-29
5872618 Projection exposure apparatus Tadashi Nagayama, Yuuki Ishii, Tohru Kiuchi 1999-02-16
5864386 Exposure apparatus 1999-01-26
5329336 Exposure method and apparatus Kazuhiro Hirano 1994-07-12