Issued Patents All Time
Showing 1–25 of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11960216 | Invariable magnification multilevel optical device with telecentric converter | Yuli Vladimirsky | 2024-04-16 |
| 11754935 | Lithographic patterning device multichannel position and level gauge | Yuli Vladimirsky | 2023-09-12 |
| 9671337 | High numerical aperture objective lens system | — | 2017-06-06 |
| 9513559 | High numerical aperture objective lens system | — | 2016-12-06 |
| 9411244 | Optical system, inspection system and manufacturing method | Yuli Vladimirsky, James H. Walsh | 2016-08-09 |
| 9285687 | Inspection apparatus, lithographic apparatus, and device manufacturing method | Stanislav Smirnov, Eric Brian Catey, Adel Joobeur, David Heald, Yevgeniy Konstantinovich Shmarev +1 more | 2016-03-15 |
| 8692977 | Optical system, inspection system and manufacturing method | Yuli Vladimirsky, James H. Walsh | 2014-04-08 |
| 8558988 | Thin film continuous spatially modulated grey attenuators and filters | Yuli Vladimirsky, Ronald A. Wilklow | 2013-10-15 |
| 8164740 | Illumination system coherence remover with two sets of stepped mirrors | Huibert Visser, Jacob Klinkhamer, Scott Coston, Adel Joobeur, Rob Vink +1 more | 2012-04-24 |
| 8159651 | Illumination system coherence remover with a series of partially reflective surfaces | Huibert Visser, Jacob Klinkhamer, Scott Coston, Adel Joobeur, Rob Vink +1 more | 2012-04-17 |
| 8013979 | Illumination system with low telecentricity error and dynamic telecentricity correction | James Tsacoyeanes, Roberto B. Wiener, Scott Coston | 2011-09-06 |
| 7859647 | Lithographic apparatus and device manufacturing method | Arno Jan Bleeker, Johannes Jacobus Matheus Baselmans, Marce Mathijs Theodore Marie Dierichs, Stanislav Smirnov, Christian Wagner +1 more | 2010-12-28 |
| 7859756 | Optical system for transforming numerical aperture | Yuli Vladimirsky | 2010-12-28 |
| 7630136 | Optical integrators for lithography systems and methods | Abel Joobeur, Yevgeniy Konstantinovich Shmarev | 2009-12-08 |
| 7532403 | Optical system for transforming numerical aperture | Yuli Vladimirsky | 2009-05-12 |
| 7365848 | System and method using visible and infrared light to align and measure alignment patterns on multiple layers | Pankaj Raval, Walter Augustyn | 2008-04-29 |
| 7289277 | Relay lens used in an illumination system of a lithography system | Stanislav Smirnov | 2007-10-30 |
| 7242456 | System and method utilizing a lithography tool having modular illumination, pattern generator, and projection optics portions | Yuli Vladimirsky, Lev Sakin | 2007-07-10 |
| 7227613 | Lithographic apparatus having double telecentric illumination | Yuli Vladimirsky | 2007-06-05 |
| 7187430 | Advanced illumination system for use in microlithography | Mark Oskotsky, Scott Coston, James Tsacoyeanes, Walter Augustyn | 2007-03-06 |
| 7023525 | Imaging apparatus | Arno Jan Bleeker, Pieter Willem Herman De Jager, Jason Hintersteiner, Borgert Kruizinga, Matthew Eugene McCarthy +6 more | 2006-04-04 |
| 6813003 | Advanced illumination system for use in microlithography | Mark Oskotsky, Scott Coston, James Tsacoyeanes, Walter Augustyn | 2004-11-02 |
| 6778257 | Imaging apparatus | Arno Jan Bleeker, Pieter Willem Herman De Jager, Jason Hintersteiner, Borgert Kruizinga, Matthew Eugene McCarthy +6 more | 2004-08-17 |
| 6775069 | Advanced illumination system for use in microlithography | Mark Oskotsky, Scott Coston, James Tsacoyeanes, Peter Baumgartner, Walter Augustyn | 2004-08-10 |
| 6307682 | Zoom illumination system for use in photolithography | Jeffrey M. Hoffman, Joseph Marshall Kunick, Mark Oskotsky | 2001-10-23 |