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Method and system for uniformly applying a multi-phase cleaning solution to a substrate |
Ji Zhu, Carl Woods, John M. de Larios |
2014-05-20 |
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Method and apparatus for cleaning a substrate using non-newtonian fluids |
John M. de Larios, Mike Ravkin, Mikhail Korolik, Fred C. Redeker |
2014-03-18 |
| 8567421 |
Method and system for uniformly applying a multi-phase cleaning solution to a substrate |
Ji Zhu, Carl Woods, John M. de Larios |
2013-10-29 |
| 8535451 |
Method and apparatus for cleaning semiconductor wafers using compressed and/or pressurized foams, bubbles, and/or liquids |
John M. de Larios, Mike Ravkin, Mikhail Korolik, Fritz Redeker, Aleksander Owczarz |
2013-09-17 |
| 8043441 |
Method and apparatus for cleaning a substrate using non-Newtonian fluids |
John M. de Larios, Mike Ravkin, Mikhail Korolik, Fred C. Redeker |
2011-10-25 |
| 7913703 |
Method and apparatus for uniformly applying a multi-phase cleaning solution to a substrate |
Ji Zhu, Carl Woods, John M. de Larios |
2011-03-29 |
| 7811424 |
Reducing mechanical resonance and improved distribution of fluids in small volume processing of semiconductor materials |
Carl Woods |
2010-10-12 |
| 7735177 |
Brush core assembly |
Christopher Pena, Edward Orbeta |
2010-06-15 |
| 7614411 |
Controls of ambient environment during wafer drying using proximity head |
Mikhail Korolik, John M. de Larios, Mike Ravkin |
2009-11-10 |
| 7568490 |
Method and apparatus for cleaning semiconductor wafers using compressed and/or pressurized foams, bubbles, and/or liquids |
John M. de Larios, Mike Ravkin, Mikhail Korolik, Fritz Redeker, Aleksander Owczarz |
2009-08-04 |
| 7452408 |
System and method for producing bubble free liquids for nanometer scale semiconductor processing |
Carl Woods |
2008-11-18 |
| 6939207 |
Method and apparatus for controlling CMP pad surface finish |
Alan J. Jensen, Mario Stella, Eugene Zhao, Peter Renteln |
2005-09-06 |
| 6645052 |
Method and apparatus for controlling CMP pad surface finish |
Alan J. Jensen, Mario Stella, Eugene Zhao, Peter Renteln |
2003-11-11 |
| 6405399 |
Method and system of cleaning a wafer after chemical mechanical polishing or plasma processing |
Julia Svirchevski |
2002-06-18 |
| 6187684 |
Methods for cleaning substrate surfaces after etch operations |
Allan M. Radman, Helmuth Treichel |
2001-02-13 |
