| 11651966 |
Methods and apparatus for processing a substrate |
Kartik Ramaswamy, Yang Yang, Kenneth S. Collins, Steven Lane, Yue Guo |
2023-05-16 |
| 11043375 |
Plasma deposition of carbon hardmask |
Yang Yang, Eswaranand Venkatasubramanian, Kartik Ramaswamy, Kenneth S. Collins, Steven Lane +2 more |
2021-06-22 |
| 11043387 |
Methods and apparatus for processing a substrate |
Kartik Ramaswamy, Yang Yang, Kenneth S. Collins, Steven Lane, Yue Guo |
2021-06-22 |
| 10790153 |
Methods and apparatus for electron beam etching process |
Yue Guo, Yang Yang, Kartik Ramaswamy, Kenneth S. Collins, Steven Lane +1 more |
2020-09-29 |
| 10707086 |
Etching methods |
Yang Yang, Kartik Ramaswamy, Kenneth S. Collins, Steven Lane, Lucy Chen +1 more |
2020-07-07 |
| 10544505 |
Deposition or treatment of diamond-like carbon in a plasma reactor |
Yang Yang, Kartik Ramaswamy, Kenneth S. Collins, Steven Lane, Lucy Chen +1 more |
2020-01-28 |
| 10249495 |
Diamond like carbon layer formed by an electron beam plasma process |
Yang Yang, Lucy Chen, Jie Zhou, Kartik Ramaswamy, Kenneth S. Collins +5 more |
2019-04-02 |
| 9721760 |
Electron beam plasma source with reduced metal contamination |
Leonid Dorf, Shahid Rauf, Kenneth S. Collins, Kartik Ramaswamy, Nipun Misra +2 more |
2017-08-01 |
| 7700465 |
Plasma immersion ion implantation process using a plasma source having low dissociation and low minimum plasma voltage |
Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Andrew Nguyen, Amir Al-Bayati +1 more |
2010-04-20 |
| 7430984 |
Method to drive spatially separate resonant structure with spatially distinct plasma secondaries using a single generator and switching elements |
Hiroji Hanawa, Kartik Ramaswamy, Kenneth S. Collins, Andrew Nguyen |
2008-10-07 |
| 7320734 |
Plasma immersion ion implantation system including a plasma source having low dissociation and low minimum plasma voltage |
Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Andrew Nguyen, Amir Al-Bayati +1 more |
2008-01-22 |
| 7303982 |
Plasma immersion ion implantation process using an inductively coupled plasma source having low dissociation and low minimum plasma voltage |
Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Andrew Nguyen, Amir Al-Bayati +1 more |
2007-12-04 |
| 7291545 |
Plasma immersion ion implantation process using a capacitively couple plasma source having low dissociation and low minimum plasma voltage |
Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Andrew Nguyen, Amir Al-Bayati +1 more |
2007-11-06 |
| 7137354 |
Plasma immersion ion implantation apparatus including a plasma source having low dissociation and low minimum plasma voltage |
Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Andrew Nguyen, Amir Al-Bayati +1 more |
2006-11-21 |
| 7037813 |
Plasma immersion ion implantation process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltage |
Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Andrew Nguyen, Amir Al-Bayati +1 more |
2006-05-02 |
