Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8792161 | Optical polarizer with nanotube array | Ryoung-Han Kim, Harry J. Levinson, Uzodinma Okoroanyanwu | 2014-07-29 |
| 8198611 | Laser beam formatting module and method for fabricating semiconductor dies using same | Obert R. Wood, II | 2012-06-12 |
| 7858276 | Method for determining suitability of a resist in semiconductor wafer fabrication | Thomas I. Wallow | 2010-12-28 |
| 7855048 | Wafer assembly having a contrast enhancing top anti-reflecting coating and method of lithographic processing | Cyrus E. Tabery, Adam R. Pawloski, Jongwook Kye | 2010-12-21 |
| 7741012 | Method for removal of immersion lithography medium in immersion lithography processes | Adam R. Pawloski, Amr Y. Abdo, Gilles Amblard, Ivan Lalovic, Harry J. Levinson +3 more | 2010-06-22 |
| 7504198 | Methods for enhancing resolution of a chemically amplified photoresist | Adam R. Pawloski, Thomas I. Wallow | 2009-03-17 |
| 7276328 | Lithography mask utilizing asymmetric light source | Cyrus E. Tabery, Ivan Lavolic | 2007-10-02 |
| 7087907 | Detection of contamination in imaging systems by fluorescence and/or absorption spectroscopy | Ivan Lalovic | 2006-08-08 |
| 7081956 | Method and device for determining reflection lens pupil transmission distribution and illumination intensity distribution in reflective imaging system | Ivan Lalovic | 2006-07-25 |
| 7060401 | Phase-shift reflective mask for lithography, and method of using and fabricating | Adam R. Pawloski, Yunfei Deng | 2006-06-13 |
| 7014966 | Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systems | Adam R. Pawloski, Amr Y. Abdo, Gilles Amblard, Ivan Lalovic, Harry J. Levinson +3 more | 2006-03-21 |
| 6984475 | Extreme ultraviolet (EUV) lithography masks | Harry J. Levinson, Ivan Lalovic, Adam R. Pawloski | 2006-01-10 |
| 6977717 | Method and device for determining projection lens pupil transmission distribution and illumination intensity distribution in photolithographic imaging system | Ivan Lalovic, Jongwook Kye | 2005-12-20 |
| 6977718 | Lithography method and system with adjustable reflector | — | 2005-12-20 |
| 6950176 | Method and system for monitoring EUV lithography mask flatness | Ivan Lavolic | 2005-09-27 |
| 6806007 | EUV mask which facilitates electro-static chucking | Amr Y. Abdo | 2004-10-19 |
| 6696847 | Photo assisted electrical linewidth measurement method and apparatus | Jongwook Kye, Harry J. Levinson | 2004-02-24 |
| 6673524 | Attenuating extreme ultraviolet (EUV) phase-shifting mask fabrication method | Kouros Ghandehari, Bhanwar Singh | 2004-01-06 |
| 6664030 | System for and method of constructing an alternating phase-shifting mask | Kouros Ghandehari, Bhanwar Singh | 2003-12-16 |
| 6593037 | EUV mask or reticle having reduced reflections | Calvin T. Gabriel, Harry J. Levinson | 2003-07-15 |
| 6589717 | Photon assisted deposition of hard mask formation for use in manufacture of both devices and masks | Kouros Ghandehari, Bhanwar Singh | 2003-07-08 |